Fluorine containing plasma etching surface chemical characterization by coulometric reduction (2003)
Source: 54 th ISE Meeting book of abstracts.. Conference titles: Meeting of the International Society of Electrochemistry. Unidade: EP
Subjects: COBRE, CORROSÃO ATMOSFÉRICA, CORROSÃO DOS MATERIAIS, ELETROQUÍMICA, INIBIDORES DE CORROSÃO, METAIS (CONSERVAÇÃO), MICROSCOPIA ELETRÔNICA
ABNT
VILCA-MELENDEZ, Hugo Antonio et al. Fluorine containing plasma etching surface chemical characterization by coulometric reduction. 2003, Anais.. São Pedro: Escola Politécnica, Universidade de São Paulo, 2003. . Acesso em: 07 out. 2024.APA
Vilca-Melendez, H. A., Ruas, R., Verdonck, P. B., & Aoki, I. V. (2003). Fluorine containing plasma etching surface chemical characterization by coulometric reduction. In 54 th ISE Meeting book of abstracts.. São Pedro: Escola Politécnica, Universidade de São Paulo.NLM
Vilca-Melendez HA, Ruas R, Verdonck PB, Aoki IV. Fluorine containing plasma etching surface chemical characterization by coulometric reduction. 54 th ISE Meeting book of abstracts. 2003 ;[citado 2024 out. 07 ]Vancouver
Vilca-Melendez HA, Ruas R, Verdonck PB, Aoki IV. Fluorine containing plasma etching surface chemical characterization by coulometric reduction. 54 th ISE Meeting book of abstracts. 2003 ;[citado 2024 out. 07 ]