Menu

Filtros : "Velez, Juan Manuel" Removido: "Silva, Carlos Henrique da" Limpar

Filtros

Refine with date range

  • 1

1 - 2 (2 records)

  • Artigo de periodico

    Residual stress gradient of Cr and CrN thin films (2018)

    Arias Mateus, Diego Fernando; Gomez, A; Souza, Roberto Martins de ; Velez, Juan Manuel

    Source: Materials Chemistry and Physics. Unidade: EP

    Subjects: TENSÃO RESIDUAL, TENSÃO DOS MATERIAIS, FILMES FINOS

    PrivadoAcesso à fonteAcesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      ARIAS MATEUS, Diego Fernando et al. Residual stress gradient of Cr and CrN thin films. Materials Chemistry and Physics, v. 204, p. 269-276, 2018Tradução . . Disponível em: https://doi.org/10.1016/j.matchemphys.2017.10.053. Acesso em: 10 nov. 2024.

    • APA

      Arias Mateus, D. F., Gomez, A., Souza, R. M. de, & Velez, J. M. (2018). Residual stress gradient of Cr and CrN thin films. Materials Chemistry and Physics, 204, 269-276. doi:10.1016/j.matchemphys.2017.10.053

    • NLM

      Arias Mateus DF, Gomez A, Souza RM de, Velez JM. Residual stress gradient of Cr and CrN thin films [Internet]. Materials Chemistry and Physics. 2018 ; 204 269-276.[citado 2024 nov. 10 ] Available from: https://doi.org/10.1016/j.matchemphys.2017.10.053

    • Vancouver

      Arias Mateus DF, Gomez A, Souza RM de, Velez JM. Residual stress gradient of Cr and CrN thin films [Internet]. Materials Chemistry and Physics. 2018 ; 204 269-276.[citado 2024 nov. 10 ] Available from: https://doi.org/10.1016/j.matchemphys.2017.10.053

  • Artigo de periodico

    TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage (2011)

    Devia, D. M.; Restrepo-Parra, E.; Arango, P. J.; Tschiptschin, André Paulo ; Velez, Juan Manuel

    Source: Applied Surface Science. Unidade: EP

    Subjects: CRISTALOGRAFIA, TITÂNIO

    Acesso à fonteAcesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      DEVIA, D. M. et al. TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage. Applied Surface Science, v. 257, n. 14, p. 6181-6185, 2011Tradução . . Disponível em: https://doi.org/10.1016/j.apsusc.2011.02.027. Acesso em: 10 nov. 2024.

    • APA

      Devia, D. M., Restrepo-Parra, E., Arango, P. J., Tschiptschin, A. P., & Velez, J. M. (2011). TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage. Applied Surface Science, 257( 14), 6181-6185. doi:10.1016/j.apsusc.2011.02.027

    • NLM

      Devia DM, Restrepo-Parra E, Arango PJ, Tschiptschin AP, Velez JM. TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage [Internet]. Applied Surface Science. 2011 ; 257( 14): 6181-6185.[citado 2024 nov. 10 ] Available from: https://doi.org/10.1016/j.apsusc.2011.02.027

    • Vancouver

      Devia DM, Restrepo-Parra E, Arango PJ, Tschiptschin AP, Velez JM. TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage [Internet]. Applied Surface Science. 2011 ; 257( 14): 6181-6185.[citado 2024 nov. 10 ] Available from: https://doi.org/10.1016/j.apsusc.2011.02.027
  • 1

1 - 2 (2 records)

Digital Library of Intellectual Production of Universidade de São Paulo     2012 - 2024