TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage (2011)
Devia, D. M.; Restrepo-Parra, E.; Arango, P. J.; Tschiptschin, André Paulo 
; Velez, Juan Manuel
Source: Applied Surface Science. Unidade: EP
Subjects: CRISTALOGRAFIA, TITÂNIO
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ABNT
DEVIA, D. M. et al. TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage. Applied Surface Science, v. 257, n. 14, p. 6181-6185, 2011Tradução . . Disponível em: https://doi.org/10.1016/j.apsusc.2011.02.027. Acesso em: 29 jul. 2024.APA
Devia, D. M., Restrepo-Parra, E., Arango, P. J., Tschiptschin, A. P., & Velez, J. M. (2011). TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage. Applied Surface Science, 257( 14), 6181-6185. doi:10.1016/j.apsusc.2011.02.027NLM
Devia DM, Restrepo-Parra E, Arango PJ, Tschiptschin AP, Velez JM. TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage [Internet]. Applied Surface Science. 2011 ; 257( 14): 6181-6185.[citado 2024 jul. 29 ] Available from: https://doi.org/10.1016/j.apsusc.2011.02.027Vancouver
Devia DM, Restrepo-Parra E, Arango PJ, Tschiptschin AP, Velez JM. TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage [Internet]. Applied Surface Science. 2011 ; 257( 14): 6181-6185.[citado 2024 jul. 29 ] Available from: https://doi.org/10.1016/j.apsusc.2011.02.027
