Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS (2012)
Santos, Sara Dereste dos 
; Nicoletti, Talitha; Aoulaiche, Marc; Martino, João Antonio ; Veloso, A; Jurczak, Malgorzata; Simoen, Eddy ; Claeys, Cor
Source: Microelectronics technology and devices, SBMicro. Conference titles: International Symposium on Microelectronics Technology and Devices. Unidade: EP
Assunto: MICROELETRÔNICA
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SANTOS, Sara Dereste dos et al. Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS. 2012, Anais.. Pennington: Escola Politécnica, Universidade de São Paulo, 2012. Disponível em: https://repositorio.usp.br/directbitstream/22d2dffe-4364-4c9f-87ae-bbce2402e1e6/3144801.pdf. Acesso em: 03 nov. 2024.APA
Santos, S. D. dos, Nicoletti, T., Aoulaiche, M., Martino, J. A., Veloso, A., Jurczak, M., et al. (2012). Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS. In Microelectronics technology and devices, SBMicro. Pennington: Escola Politécnica, Universidade de São Paulo. Recuperado de https://repositorio.usp.br/directbitstream/22d2dffe-4364-4c9f-87ae-bbce2402e1e6/3144801.pdfNLM
Santos SD dos, Nicoletti T, Aoulaiche M, Martino JA, Veloso A, Jurczak M, Simoen E, Claeys C. Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS [Internet]. Microelectronics technology and devices, SBMicro. 2012 ;[citado 2024 nov. 03 ] Available from: https://repositorio.usp.br/directbitstream/22d2dffe-4364-4c9f-87ae-bbce2402e1e6/3144801.pdfVancouver
Santos SD dos, Nicoletti T, Aoulaiche M, Martino JA, Veloso A, Jurczak M, Simoen E, Claeys C. Spacer length and tilt implantation influence on scaled UTBOX FD MOSFETS [Internet]. Microelectronics technology and devices, SBMicro. 2012 ;[citado 2024 nov. 03 ] Available from: https://repositorio.usp.br/directbitstream/22d2dffe-4364-4c9f-87ae-bbce2402e1e6/3144801.pdf
