Assunto: NANOPARTÍCULAS
ABNT
COSTA, Daniel da Silva et al. In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film. v. 879, 2021Tradução . . Disponível em: https://doi.org/10.1016/j.jallcom.2021.160345. Acesso em: 02 nov. 2025.APA
Costa, D. da S., Kellermann, G., Craievich, A. F., Giovanetti, L. J., Huck-Iriart, C., & Requejo, F. G. (2021). In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film, 879. doi:10.1016/j.jallcom.2021.160345NLM
Costa D da S, Kellermann G, Craievich AF, Giovanetti LJ, Huck-Iriart C, Requejo FG. In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film [Internet]. 2021 ; 879[citado 2025 nov. 02 ] Available from: https://doi.org/10.1016/j.jallcom.2021.160345Vancouver
Costa D da S, Kellermann G, Craievich AF, Giovanetti LJ, Huck-Iriart C, Requejo FG. In situ study of the process of formation of hexagonal NiSi2 nanoplates and spherical Ni nanoparticles embedded in a Si(001) wafer covered by a Ni-doped SiO2 thin film [Internet]. 2021 ; 879[citado 2025 nov. 02 ] Available from: https://doi.org/10.1016/j.jallcom.2021.160345
