Krishnasamy, Balaji; Shanmugaraj, Balakrishnan P; Murugavel, Salem Chandrasekaran; Dai, Lizong; Petri, Denise Freitas Siqueira 
Source: International Journal of Polymer Analysis and Characterization. Unidade: IQ
Subjects: RESINAS EPOXI, ESPECTROSCOPIA
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KRISHNASAMY, Balaji et al. Investigation on dual functional epoxy resins containing photosensitive group in the main chain for photoresist applications. International Journal of Polymer Analysis and Characterization, v. 25, p. N. 4 198–215, 2020Tradução . . Disponível em: https://doi.org/10.1080/1023666X.2020.1780849. Acesso em: 30 set. 2024.APA
Krishnasamy, B., Shanmugaraj, B. P., Murugavel, S. C., Dai, L., & Petri, D. F. S. (2020). Investigation on dual functional epoxy resins containing photosensitive group in the main chain for photoresist applications. International Journal of Polymer Analysis and Characterization, 25, N. 4 198–215. doi:10.1080/1023666X.2020.1780849NLM
Krishnasamy B, Shanmugaraj BP, Murugavel SC, Dai L, Petri DFS. Investigation on dual functional epoxy resins containing photosensitive group in the main chain for photoresist applications [Internet]. International Journal of Polymer Analysis and Characterization. 2020 ; 25 N. 4 198–215.[citado 2024 set. 30 ] Available from: https://doi.org/10.1080/1023666X.2020.1780849Vancouver
Krishnasamy B, Shanmugaraj BP, Murugavel SC, Dai L, Petri DFS. Investigation on dual functional epoxy resins containing photosensitive group in the main chain for photoresist applications [Internet]. International Journal of Polymer Analysis and Characterization. 2020 ; 25 N. 4 198–215.[citado 2024 set. 30 ] Available from: https://doi.org/10.1080/1023666X.2020.1780849
