Porous silicon sacrifical layers applied on micromechanical structures fabrication (2002)
Fonte: Microelectronics Technology and Devices SBMICRO 2002. Unidade: EP
Assunto: MICROELETRÔNICA
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DANTAS, Michel Oliveira da Silva et al. Porous silicon sacrifical layers applied on micromechanical structures fabrication. Microelectronics Technology and Devices SBMICRO 2002. Tradução . Pennington: The Electrochemical Society, 2002. . . Acesso em: 30 set. 2024.APA
Dantas, M. O. da S., Galeazzo, E., Peres, H. E. M., & Ramírez Fernandez, F. J. (2002). Porous silicon sacrifical layers applied on micromechanical structures fabrication. In Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society.NLM
Dantas MO da S, Galeazzo E, Peres HEM, Ramírez Fernandez FJ. Porous silicon sacrifical layers applied on micromechanical structures fabrication. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2024 set. 30 ]Vancouver
Dantas MO da S, Galeazzo E, Peres HEM, Ramírez Fernandez FJ. Porous silicon sacrifical layers applied on micromechanical structures fabrication. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2024 set. 30 ]