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Filtros : "Cruz, N C" Limpar

Filtros

Artigo de periodico
Argon ion implantation inducing modifications in the properties of benzene plasma polymers (2002)
Rangel, Elidiane Cipriano ; Cruz, N C; Santos, D C R; Algatti, M A; Honda, R Y; Silva, P A F; Costa, M S; Tabacniks, Manfredo Harri
Source: Nuclear Instruments and Methods in Physics Research B. Unidade: IF
Assunto: FÍSICA DE PLASMAS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
RANGEL, Elidiane Cipriano et al. Argon ion implantation inducing modifications in the properties of benzene plasma polymers. Nuclear Instruments and Methods in Physics Research B, v. 191, p. 700-703, 2002Tradução . . Disponível em: https://doi.org/10.1016/s0168-583x(02)00636-5. Acesso em: 06 nov. 2024.
APA
Rangel, E. C., Cruz, N. C., Santos, D. C. R., Algatti, M. A., Honda, R. Y., Silva, P. A. F., et al. (2002). Argon ion implantation inducing modifications in the properties of benzene plasma polymers. Nuclear Instruments and Methods in Physics Research B, 191, 700-703. doi:10.1016/s0168-583x(02)00636-5
NLM
Rangel EC, Cruz NC, Santos DCR, Algatti MA, Honda RY, Silva PAF, Costa MS, Tabacniks MH. Argon ion implantation inducing modifications in the properties of benzene plasma polymers [Internet]. Nuclear Instruments and Methods in Physics Research B. 2002 ; 191 700-703.[citado 2024 nov. 06 ] Available from: https://doi.org/10.1016/s0168-583x(02)00636-5
Vancouver
Rangel EC, Cruz NC, Santos DCR, Algatti MA, Honda RY, Silva PAF, Costa MS, Tabacniks MH. Argon ion implantation inducing modifications in the properties of benzene plasma polymers [Internet]. Nuclear Instruments and Methods in Physics Research B. 2002 ; 191 700-703.[citado 2024 nov. 06 ] Available from: https://doi.org/10.1016/s0168-583x(02)00636-5
Artigo de periodico
Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar (2002)
Jacobsohn, L G; Capote, G; Cruz, N C; Zanatta, Antonio Ricardo ; Freire Junior, F L
Source: Thin Solid Films. Unidade: IFSC
Subjects: FÍSICA DA MATÉRIA CONDENSADA, FILMES FINOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
JACOBSOHN, L G et al. Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar. Thin Solid Films, v. No 2002, n. 1-2, p. 46-53, 2002Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(02)00756-3. Acesso em: 06 nov. 2024.
APA
Jacobsohn, L. G., Capote, G., Cruz, N. C., Zanatta, A. R., & Freire Junior, F. L. (2002). Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar. Thin Solid Films, No 2002( 1-2), 46-53. doi:10.1016/s0040-6090(02)00756-3
NLM
Jacobsohn LG, Capote G, Cruz NC, Zanatta AR, Freire Junior FL. Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar [Internet]. Thin Solid Films. 2002 ; No 2002( 1-2): 46-53.[citado 2024 nov. 06 ] Available from: https://doi.org/10.1016/s0040-6090(02)00756-3
Vancouver
Jacobsohn LG, Capote G, Cruz NC, Zanatta AR, Freire Junior FL. Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar [Internet]. Thin Solid Films. 2002 ; No 2002( 1-2): 46-53.[citado 2024 nov. 06 ] Available from: https://doi.org/10.1016/s0040-6090(02)00756-3

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