Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar (2002)
Source: Thin Solid Films. Unidade: IFSC
Subjects: FÍSICA DA MATÉRIA CONDENSADA, FILMES FINOS
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JACOBSOHN, L G et al. Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar. Thin Solid Films, v. No 2002, n. 1-2, p. 46-53, 2002Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(02)00756-3. Acesso em: 22 jun. 2024.APA
Jacobsohn, L. G., Capote, G., Cruz, N. C., Zanatta, A. R., & Freire Junior, F. L. (2002). Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar. Thin Solid Films, No 2002( 1-2), 46-53. doi:10.1016/s0040-6090(02)00756-3NLM
Jacobsohn LG, Capote G, Cruz NC, Zanatta AR, Freire Junior FL. Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar [Internet]. Thin Solid Films. 2002 ; No 2002( 1-2): 46-53.[citado 2024 jun. 22 ] Available from: https://doi.org/10.1016/s0040-6090(02)00756-3Vancouver
Jacobsohn LG, Capote G, Cruz NC, Zanatta AR, Freire Junior FL. Plasma deposition of amorphous carbon films from 'CH IND.4' atmospheres highly diluted in Ar [Internet]. Thin Solid Films. 2002 ; No 2002( 1-2): 46-53.[citado 2024 jun. 22 ] Available from: https://doi.org/10.1016/s0040-6090(02)00756-3
