Teixeira, Antonio Carlos S. C. 
; Guardani, Roberto ; Nascimento, Cláudio Augusto Oller do
Fonte: CHISA 2002: proceedings. Nome do evento: International Congress of Chemical and Process Engineering. Unidade: EP
Assuntos: TRATAMENTO DE ÁGUAS RESIDUÁRIAS, POLUIÇÃO DA ÁGUA, TRATAMENTO QUÍMICO DE ÁGUA
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TEIXEIRA, Antonio Carlos S. C. e GUARDANI, Roberto e NASCIMENTO, Cláudio Augusto Oller do. Remediation of aminosilicone-containing wastewaters by advanced oxidation processes: comparison of artificial and solar irradiation in the photo-phenton reaction. 2002, Anais.. Praha: CSCHI, 2002. . Acesso em: 26 jul. 2024.APA
Teixeira, A. C. S. C., Guardani, R., & Nascimento, C. A. O. do. (2002). Remediation of aminosilicone-containing wastewaters by advanced oxidation processes: comparison of artificial and solar irradiation in the photo-phenton reaction. In CHISA 2002: proceedings. Praha: CSCHI.NLM
Teixeira ACSC, Guardani R, Nascimento CAO do. Remediation of aminosilicone-containing wastewaters by advanced oxidation processes: comparison of artificial and solar irradiation in the photo-phenton reaction. CHISA 2002: proceedings. 2002 ;[citado 2024 jul. 26 ]Vancouver
Teixeira ACSC, Guardani R, Nascimento CAO do. Remediation of aminosilicone-containing wastewaters by advanced oxidation processes: comparison of artificial and solar irradiation in the photo-phenton reaction. CHISA 2002: proceedings. 2002 ;[citado 2024 jul. 26 ]
