Innovative low temperature plasma approach for deposition of alumina films (2014)
Source: Materials Research. Unidade: IF
Subjects: FÍSICA NUCLEAR, MATERIAIS, FÍSICA DE PLASMAS, ALUMÍNIO
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BATTAGLIN, Felipe Augusto Darriba et al. Innovative low temperature plasma approach for deposition of alumina films. Materials Research, v. 17, n. 6, p. 1410-1419, 2014Tradução . . Disponível em: https://doi.org/10.1590/1516-1439.283514. Acesso em: 30 set. 2024.APA
Battaglin, F. A. D., Hosokawa, R. S., Cruz, N. C. da, Caseli, L., Rangel, E. C., Silva, T. F. da, & Tabacniks, M. (2014). Innovative low temperature plasma approach for deposition of alumina films. Materials Research, 17( 6), 1410-1419. doi:10.1590/1516-1439.283514NLM
Battaglin FAD, Hosokawa RS, Cruz NC da, Caseli L, Rangel EC, Silva TF da, Tabacniks M. Innovative low temperature plasma approach for deposition of alumina films [Internet]. Materials Research. 2014 ; 17( 6): 1410-1419.[citado 2024 set. 30 ] Available from: https://doi.org/10.1590/1516-1439.283514Vancouver
Battaglin FAD, Hosokawa RS, Cruz NC da, Caseli L, Rangel EC, Silva TF da, Tabacniks M. Innovative low temperature plasma approach for deposition of alumina films [Internet]. Materials Research. 2014 ; 17( 6): 1410-1419.[citado 2024 set. 30 ] Available from: https://doi.org/10.1590/1516-1439.283514