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Filtros : "FILMES FINOS" "Escote, Marcia Tsuyama" Limpar

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  • Artigo de periodico

    Preparation and characterization of a disilylated naphthalenediimide molecular crystal: perspectives for organosilica mesoporous materials (2024)

    Assis, Renan Gabriel de ; Oliveira Junior, Marcos de ; Escote, Marcia Tsuyama ; Pinheiro, Carlos Basílio ; Acuña, José Javier Sáez ; Ferreira, Fabio Furlan ; Pedroza, Luana Sucupira ; Brochsztain, Sérgio ; Queiroz, Thiago Branquinho de

    Fonte: ACS Applied Engineering Materials. Unidades: IFSC, IF

    Assuntos: FOTOCONDUTIVIDADE, FILMES FINOS, RESSONÂNCIA MAGNÉTICA NUCLEAR, DIFRAÇÃO POR RAIOS X

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    • ABNT

      ASSIS, Renan Gabriel de et al. Preparation and characterization of a disilylated naphthalenediimide molecular crystal: perspectives for organosilica mesoporous materials. ACS Applied Engineering Materials, v. 2, n. 7, p. 1976-1986 + supporting information: s1-s11, 2024Tradução . . Disponível em: https://doi.org/10.1021/acsaenm.4c00341. Acesso em: 03 nov. 2024.

    • APA

      Assis, R. G. de, Oliveira Junior, M. de, Escote, M. T., Pinheiro, C. B., Acuña, J. J. S., Ferreira, F. F., et al. (2024). Preparation and characterization of a disilylated naphthalenediimide molecular crystal: perspectives for organosilica mesoporous materials. ACS Applied Engineering Materials, 2( 7), 1976-1986 + supporting information: s1-s11. doi:10.1021/acsaenm.4c00341

    • NLM

      Assis RG de, Oliveira Junior M de, Escote MT, Pinheiro CB, Acuña JJS, Ferreira FF, Pedroza LS, Brochsztain S, Queiroz TB de. Preparation and characterization of a disilylated naphthalenediimide molecular crystal: perspectives for organosilica mesoporous materials [Internet]. ACS Applied Engineering Materials. 2024 ; 2( 7): 1976-1986 + supporting information: s1-s11.[citado 2024 nov. 03 ] Available from: https://doi.org/10.1021/acsaenm.4c00341

    • Vancouver

      Assis RG de, Oliveira Junior M de, Escote MT, Pinheiro CB, Acuña JJS, Ferreira FF, Pedroza LS, Brochsztain S, Queiroz TB de. Preparation and characterization of a disilylated naphthalenediimide molecular crystal: perspectives for organosilica mesoporous materials [Internet]. ACS Applied Engineering Materials. 2024 ; 2( 7): 1976-1986 + supporting information: s1-s11.[citado 2024 nov. 03 ] Available from: https://doi.org/10.1021/acsaenm.4c00341

  • Trabalho de evento-resumo

    Preparation and characterization of N,N’-bis(3- triethoxysilylpropyl)-1,4,5,8-naphthalenediimide(NDI) molecular crystal and NDI mesoporous organosilicas for durable organo-electronic systems (2024)

    Assis, Renan Gabriel de ; Oliveira Junior, Marcos de ; Escote, Marcia Tsuyama ; Acuña, José Javier Sáez ; Ferreira, Fabio Furlan ; Pedroza, Luana Sucupira ; Brochsztain, Sérgio ; Queiroz, Thiago Branquinho de

    Fonte: Presentation program. Nome do evento: Brazil MRS Meeting. Unidades: IFSC, IF

    Assuntos: FILMES FINOS, RESSONÂNCIA MAGNÉTICA NUCLEAR, DIFRAÇÃO POR RAIOS X, ESPECTROSCOPIA DE RESSONÂNCIA MAGNÉTICA NUCLEAR

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    • ABNT

      ASSIS, Renan Gabriel de et al. Preparation and characterization of N,N’-bis(3- triethoxysilylpropyl)-1,4,5,8-naphthalenediimide(NDI) molecular crystal and NDI mesoporous organosilicas for durable organo-electronic systems. 2024, Anais.. Rio de Janeiro: Sociedade Brasileira de Pesquisa em Materiais - SBPMat, 2024. Disponível em: https://www.eventweb.com.br/xxiisbpmat/specific-files/manuscripts/xxiisbpmat/914_1712604608.pdf. Acesso em: 03 nov. 2024.

    • APA

      Assis, R. G. de, Oliveira Junior, M. de, Escote, M. T., Acuña, J. J. S., Ferreira, F. F., Pedroza, L. S., et al. (2024). Preparation and characterization of N,N’-bis(3- triethoxysilylpropyl)-1,4,5,8-naphthalenediimide(NDI) molecular crystal and NDI mesoporous organosilicas for durable organo-electronic systems. In Presentation program. Rio de Janeiro: Sociedade Brasileira de Pesquisa em Materiais - SBPMat. Recuperado de https://www.eventweb.com.br/xxiisbpmat/specific-files/manuscripts/xxiisbpmat/914_1712604608.pdf

    • NLM

      Assis RG de, Oliveira Junior M de, Escote MT, Acuña JJS, Ferreira FF, Pedroza LS, Brochsztain S, Queiroz TB de. Preparation and characterization of N,N’-bis(3- triethoxysilylpropyl)-1,4,5,8-naphthalenediimide(NDI) molecular crystal and NDI mesoporous organosilicas for durable organo-electronic systems [Internet]. Presentation program. 2024 ;[citado 2024 nov. 03 ] Available from: https://www.eventweb.com.br/xxiisbpmat/specific-files/manuscripts/xxiisbpmat/914_1712604608.pdf

    • Vancouver

      Assis RG de, Oliveira Junior M de, Escote MT, Acuña JJS, Ferreira FF, Pedroza LS, Brochsztain S, Queiroz TB de. Preparation and characterization of N,N’-bis(3- triethoxysilylpropyl)-1,4,5,8-naphthalenediimide(NDI) molecular crystal and NDI mesoporous organosilicas for durable organo-electronic systems [Internet]. Presentation program. 2024 ;[citado 2024 nov. 03 ] Available from: https://www.eventweb.com.br/xxiisbpmat/specific-files/manuscripts/xxiisbpmat/914_1712604608.pdf

  • Artigo de periodico

    Pressure-induced electrical and structural anomalies in `Pb IND.1-X´`Ca IND.X´`TiO IND.3´ thin films grown at various oxygen pressures by chemical solution route (2008)

    Pontes, F M; Galhiane, Mário Sérgio; Santos, L S; Rissato, Sandra Regina; Pontes, D S L; Longo, E; Leite, E R; Chiquito, Adenilson José; Pizani, Paulo Sérgio; Jardim, R. F.; Escote, Marcia Tsuyama

    Fonte: Journal of Physics D-Applied Physics. Unidade: IF

    Assunto: FILMES FINOS

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    • ABNT

      PONTES, F M et al. Pressure-induced electrical and structural anomalies in `Pb IND.1-X´`Ca IND.X´`TiO IND.3´ thin films grown at various oxygen pressures by chemical solution route. Journal of Physics D-Applied Physics, v. 41, n. 11, p. 115402/1-115402/8, 2008Tradução . . Disponível em: http://www.iop.org/EJ/article/0022-3727/41/11/115402/d8_11_115402.pdf?request-id=53233735-2601-4714-a8ca-e34cc624732e. Acesso em: 03 nov. 2024.

    • APA

      Pontes, F. M., Galhiane, M. S., Santos, L. S., Rissato, S. R., Pontes, D. S. L., Longo, E., et al. (2008). Pressure-induced electrical and structural anomalies in `Pb IND.1-X´`Ca IND.X´`TiO IND.3´ thin films grown at various oxygen pressures by chemical solution route. Journal of Physics D-Applied Physics, 41( 11), 115402/1-115402/8. Recuperado de http://www.iop.org/EJ/article/0022-3727/41/11/115402/d8_11_115402.pdf?request-id=53233735-2601-4714-a8ca-e34cc624732e

    • NLM

      Pontes FM, Galhiane MS, Santos LS, Rissato SR, Pontes DSL, Longo E, Leite ER, Chiquito AJ, Pizani PS, Jardim RF, Escote MT. Pressure-induced electrical and structural anomalies in `Pb IND.1-X´`Ca IND.X´`TiO IND.3´ thin films grown at various oxygen pressures by chemical solution route [Internet]. Journal of Physics D-Applied Physics. 2008 ; 41( 11): 115402/1-115402/8.[citado 2024 nov. 03 ] Available from: http://www.iop.org/EJ/article/0022-3727/41/11/115402/d8_11_115402.pdf?request-id=53233735-2601-4714-a8ca-e34cc624732e

    • Vancouver

      Pontes FM, Galhiane MS, Santos LS, Rissato SR, Pontes DSL, Longo E, Leite ER, Chiquito AJ, Pizani PS, Jardim RF, Escote MT. Pressure-induced electrical and structural anomalies in `Pb IND.1-X´`Ca IND.X´`TiO IND.3´ thin films grown at various oxygen pressures by chemical solution route [Internet]. Journal of Physics D-Applied Physics. 2008 ; 41( 11): 115402/1-115402/8.[citado 2024 nov. 03 ] Available from: http://www.iop.org/EJ/article/0022-3727/41/11/115402/d8_11_115402.pdf?request-id=53233735-2601-4714-a8ca-e34cc624732e
  • 1

1 - 3 (3 registros)

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