Electrodeposition of magnetic CoPd thin films: Influence of plating condition (2007)
Fonte: Electrochimica Acta. Unidade: IQ
Assuntos: ELETRODEPOSIÇÃO, PALÁDIO, FILMES FINOS
ABNT
TAKATA, Fernanda Merie e SUMODJO, Paulo Teng An. Electrodeposition of magnetic CoPd thin films: Influence of plating condition. Electrochimica Acta, v. 52 n. 20, p. 6089-6096, 2007Tradução . . Disponível em: https://doi.org/10.1016/j.electacta.2007.03.048. Acesso em: 01 out. 2024.APA
Takata, F. M., & Sumodjo, P. T. A. (2007). Electrodeposition of magnetic CoPd thin films: Influence of plating condition. Electrochimica Acta, 52 n. 20, 6089-6096. doi:10.1016/j.electacta.2007.03.048NLM
Takata FM, Sumodjo PTA. Electrodeposition of magnetic CoPd thin films: Influence of plating condition [Internet]. Electrochimica Acta. 2007 ; 52 n. 20 6089-6096.[citado 2024 out. 01 ] Available from: https://doi.org/10.1016/j.electacta.2007.03.048Vancouver
Takata FM, Sumodjo PTA. Electrodeposition of magnetic CoPd thin films: Influence of plating condition [Internet]. Electrochimica Acta. 2007 ; 52 n. 20 6089-6096.[citado 2024 out. 01 ] Available from: https://doi.org/10.1016/j.electacta.2007.03.048