Source: Journal of Vacuum Science & Technology A. Unidade: IF
Subjects: FILMES FINOS, VÁCUO
ABNT
SALVADORI, Maria Cecília Barbosa da Silveira et al. Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness. Journal of Vacuum Science & Technology A, v. 25, n. 2, p. 330-333, 2007Tradução . . Disponível em: https://doi.org/10.1116/1.2699254. Acesso em: 12 jul. 2024.APA
Salvadori, M. C. B. da S., Cattani, M. S. D., Teixeira, F. S., Wiederkehr, R. S., & Brown, I. G. (2007). Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness. Journal of Vacuum Science & Technology A, 25( 2), 330-333. doi:10.1116/1.2699254NLM
Salvadori MCB da S, Cattani MSD, Teixeira FS, Wiederkehr RS, Brown IG. Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness [Internet]. Journal of Vacuum Science & Technology A. 2007 ; 25( 2): 330-333.[citado 2024 jul. 12 ] Available from: https://doi.org/10.1116/1.2699254Vancouver
Salvadori MCB da S, Cattani MSD, Teixeira FS, Wiederkehr RS, Brown IG. Anisotropic resistivity of thin films due to quantum electron scattering from anisotropic surface roughness [Internet]. Journal of Vacuum Science & Technology A. 2007 ; 25( 2): 330-333.[citado 2024 jul. 12 ] Available from: https://doi.org/10.1116/1.2699254