Source: Metal-induced crystallization: fundamentals and applications. Unidade: IFSC
Subjects: SEMICONDUTORES, FILMES FINOS, CRISTALIZAÇÃO
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ABNT
ZANATTA, Antonio Ricardo e FERRI, Fabio A. Metal-induced crystallization by homogeneous insertion of metallic species in amorphous semiconductors. Metal-induced crystallization: fundamentals and applications. Tradução . New York: CRC Press, 2015. . Disponível em: https://doi.org/10.1201/b18032-5. Acesso em: 09 jul. 2024.APA
Zanatta, A. R., & Ferri, F. A. (2015). Metal-induced crystallization by homogeneous insertion of metallic species in amorphous semiconductors. In Metal-induced crystallization: fundamentals and applications. New York: CRC Press. doi:10.1201/b18032-5NLM
Zanatta AR, Ferri FA. Metal-induced crystallization by homogeneous insertion of metallic species in amorphous semiconductors [Internet]. In: Metal-induced crystallization: fundamentals and applications. New York: CRC Press; 2015. [citado 2024 jul. 09 ] Available from: https://doi.org/10.1201/b18032-5Vancouver
Zanatta AR, Ferri FA. Metal-induced crystallization by homogeneous insertion of metallic species in amorphous semiconductors [Internet]. In: Metal-induced crystallization: fundamentals and applications. New York: CRC Press; 2015. [citado 2024 jul. 09 ] Available from: https://doi.org/10.1201/b18032-5
