Optical and structural characteristics of Fe-doped amorphous Si films prepared by sputtering (2009)
Source: Abstracts. Conference titles: Brazilian Workshop on Semiconductor Physics - BWSP. Unidade: IFSC
Subjects: MATERIAIS (PROPRIEDADES ELÉTRICAS), FERRO (ESTRUTURA;CARACTERÍSTICAS), FILMES FINOS
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GALLO, Ivan Braga e ZANATTA, Antonio Ricardo. Optical and structural characteristics of Fe-doped amorphous Si films prepared by sputtering. 2009, Anais.. Curitiba: Universidade Federal do Paraná, 2009. . Acesso em: 30 jun. 2024.APA
Gallo, I. B., & Zanatta, A. R. (2009). Optical and structural characteristics of Fe-doped amorphous Si films prepared by sputtering. In Abstracts. Curitiba: Universidade Federal do Paraná.NLM
Gallo IB, Zanatta AR. Optical and structural characteristics of Fe-doped amorphous Si films prepared by sputtering. Abstracts. 2009 ;[citado 2024 jun. 30 ]Vancouver
Gallo IB, Zanatta AR. Optical and structural characteristics of Fe-doped amorphous Si films prepared by sputtering. Abstracts. 2009 ;[citado 2024 jun. 30 ]
