Khan, Niqab 
; Bajiri, Mohammed Abdullah ; Rosa, Washington Santa ; Valverde, João Victor Pereira ; Mendonça, Cleber Renato ; De Boni, Leonardo ; Avansi Junior, Waldir ; Wender, Heberton ; Souza, Flavio L. ; Gonçalves, Renato Vitalino
Source: ChemCatChem. Unidade: IFSC
Subjects: SEMICONDUTORES (FÍSICO-QUÍMICA), FOTOCATÁLISE, CAMPO ELETROMAGNÉTICO, FOTOQUÍMICA
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KHAN, Niqab et al. Surface recombination suppression in BiVO4 photoanodes through sequential deposition of FeCoOx and NiOx thin films. ChemCatChem, v. 18, n. Ja 2026, p. e01328-1-e01328-11 + supporting information, 2026Tradução . . Disponível em: https://doi.org/10.1002/cctc.202501328. Acesso em: 09 fev. 2026.APA
Khan, N., Bajiri, M. A., Rosa, W. S., Valverde, J. V. P., Mendonça, C. R., De Boni, L., et al. (2026). Surface recombination suppression in BiVO4 photoanodes through sequential deposition of FeCoOx and NiOx thin films. ChemCatChem, 18( Ja 2026), e01328-1-e01328-11 + supporting information. doi:10.1002/cctc.202501328NLM
Khan N, Bajiri MA, Rosa WS, Valverde JVP, Mendonça CR, De Boni L, Avansi Junior W, Wender H, Souza FL, Gonçalves RV. Surface recombination suppression in BiVO4 photoanodes through sequential deposition of FeCoOx and NiOx thin films [Internet]. ChemCatChem. 2026 ; 18( Ja 2026): e01328-1-e01328-11 + supporting information.[citado 2026 fev. 09 ] Available from: https://doi.org/10.1002/cctc.202501328Vancouver
Khan N, Bajiri MA, Rosa WS, Valverde JVP, Mendonça CR, De Boni L, Avansi Junior W, Wender H, Souza FL, Gonçalves RV. Surface recombination suppression in BiVO4 photoanodes through sequential deposition of FeCoOx and NiOx thin films [Internet]. ChemCatChem. 2026 ; 18( Ja 2026): e01328-1-e01328-11 + supporting information.[citado 2026 fev. 09 ] Available from: https://doi.org/10.1002/cctc.202501328
