Source: Journal of Photochemistry and Photobiology B. Unidade: IFSC
Subjects: TERAPIA FOTODINÂMICA, NEOPLASIAS (TRATAMENTO)
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FARIA, Clara Maria Gonçalves de et al. A threshold dose distribution approach for the study of PDT resistance development: a threshold distribution approach for the study of PDT resistance. Journal of Photochemistry and Photobiology B, v. 182, p. 85-91, 2018Tradução . . Disponível em: https://doi.org/10.1016/j.jphotobiol.2018.03.022. Acesso em: 12 jul. 2024.APA
Faria, C. M. G. de, Inada, N. M., Vollet-Filho, J. D., & Bagnato, V. S. (2018). A threshold dose distribution approach for the study of PDT resistance development: a threshold distribution approach for the study of PDT resistance. Journal of Photochemistry and Photobiology B, 182, 85-91. doi:10.1016/j.jphotobiol.2018.03.022NLM
Faria CMG de, Inada NM, Vollet-Filho JD, Bagnato VS. A threshold dose distribution approach for the study of PDT resistance development: a threshold distribution approach for the study of PDT resistance [Internet]. Journal of Photochemistry and Photobiology B. 2018 ; 182 85-91.[citado 2024 jul. 12 ] Available from: https://doi.org/10.1016/j.jphotobiol.2018.03.022Vancouver
Faria CMG de, Inada NM, Vollet-Filho JD, Bagnato VS. A threshold dose distribution approach for the study of PDT resistance development: a threshold distribution approach for the study of PDT resistance [Internet]. Journal of Photochemistry and Photobiology B. 2018 ; 182 85-91.[citado 2024 jul. 12 ] Available from: https://doi.org/10.1016/j.jphotobiol.2018.03.022
