Plasma-assisted chemical vapour deposition in a tunable microwave cavity (1995)
Source: Plasma Sources Science Technology. Unidade: IF
Assunto: FÍSICO-QUÍMICA
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ABNT
SALVADORI, M C et al. Plasma-assisted chemical vapour deposition in a tunable microwave cavity. Plasma Sources Science Technology, v. 4 , p. 489-94, 1995Tradução . . Disponível em: https://doi.org/10.1088/0963-0252/4/3/019. Acesso em: 28 jun. 2024.APA
Salvadori, M. C., Mammana, V. P., Martins, O. G., & Degasperi, F. T. (1995). Plasma-assisted chemical vapour deposition in a tunable microwave cavity. Plasma Sources Science Technology, 4 , 489-94. doi:10.1088/0963-0252/4/3/019NLM
Salvadori MC, Mammana VP, Martins OG, Degasperi FT. Plasma-assisted chemical vapour deposition in a tunable microwave cavity [Internet]. Plasma Sources Science Technology. 1995 ;4 489-94.[citado 2024 jun. 28 ] Available from: https://doi.org/10.1088/0963-0252/4/3/019Vancouver
Salvadori MC, Mammana VP, Martins OG, Degasperi FT. Plasma-assisted chemical vapour deposition in a tunable microwave cavity [Internet]. Plasma Sources Science Technology. 1995 ;4 489-94.[citado 2024 jun. 28 ] Available from: https://doi.org/10.1088/0963-0252/4/3/019
