Effect of zirconia surface cleaning on deposition of silica via RT-ALD (2020)
- Authors:
- Autor USP: BOMBONATTI, JULIANA FRAGA SOARES - FOB
- Unidade: FOB
- Subjects: ZIRCÔNIA; MICROSCOPIA ELETRÔNICA DE VARREDURA; ESPECTROSCOPIA DE RAIO X
- Agências de fomento:
- Language: Inglês
- Abstract: Silica-based nanofilm has been deposited via Room Temperature Atomic Layer Deposition (RT-ALD) on glass surface. The purpose of this study was to evaluate different cleaning methods on surface of yttria-stabilized zirconia (Y-TZP) before and after silica deposition via RT-ALD. Fully-sintered 3Y-TZP (MO, IPS e.max Zircad, Ivoclar Vivadent) samples (n=28) were cleaned with acetone for 12 minutes and distributed according to surface cleaning method: no further cleaning (control - C), Oxygen plasma (OP - 2 min) and Hydrochloric acid (HCA, 0.1M - 10 min). RT-ALD cycles consisted of exposure to tetramethoxysilane orthosilicate (TMOS - 60s) and ammonium hydroxide (NH4OH - 10 min) vapors in 10 and 20 cycles. For the OP groups, RT-ALD was applied in two conditions: immediate and after 24 hrs. Surface wettability was analyzed by contact angle measurement before and after RT-ALD. Y-TZP surface was evaluated under scanning electron microscopy (SEM) and silica deposition was quantified by Energy-dispersive X-ray spectroscopy (EDS). OP cleaning resulted in the lowest contact angle (38.92). The highest contact angle prior to RT-ALD was measured in group OP after 24 hrs. Silica deposition decreased surface wettability in all groups. EDS analysis showed higher silica content after cleaning with HCA and 20 cycles of RT-ALD. SEM analysis showed surface changes after all cleaning procedures. Immediate cleaning with OP and HCA result in more successful deposition of silica.
- Imprenta:
- Source:
- Título do periódico: Brazilian Oral Research
- Volume/Número/Paginação/Ano: 1807-3107
- Conference titles: Sociedade Brasileira de Pesquisa Odontológica - SBPqO - Virtual Annual Meeting
-
ABNT
BASTOS, N. A. et al. Effect of zirconia surface cleaning on deposition of silica via RT-ALD. Brazilian Oral Research. São Paulo: Faculdade de Odontologia de Bauru, Universidade de São Paulo. . Acesso em: 24 abr. 2024. , 2020 -
APA
Bastos, N. A., Bombonatti, J. F. S., Bitencourt, S. B., Hatton, B., & DeSouza, G. M. (2020). Effect of zirconia surface cleaning on deposition of silica via RT-ALD. Brazilian Oral Research. São Paulo: Faculdade de Odontologia de Bauru, Universidade de São Paulo. -
NLM
Bastos NA, Bombonatti JFS, Bitencourt SB, Hatton B, DeSouza GM. Effect of zirconia surface cleaning on deposition of silica via RT-ALD. Brazilian Oral Research. 2020 ;[citado 2024 abr. 24 ] -
Vancouver
Bastos NA, Bombonatti JFS, Bitencourt SB, Hatton B, DeSouza GM. Effect of zirconia surface cleaning on deposition of silica via RT-ALD. Brazilian Oral Research. 2020 ;[citado 2024 abr. 24 ] - Influência do método de processamento na adaptação marginal e interna de inlays/onlays de dissilicato de lítio: metanálise
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