Investigation of the Fe-Mo electrodeposition from sorbitol alkaline bath and characterization of the films produced (2018)
- Authors:
- Autor USP: MASTELARO, VALMOR ROBERTO - IFSC
- Unidade: IFSC
- DOI: 10.1016/j.jallcom.2018.04.020
- Subjects: FILMES FINOS; FERRO; ELETRODEPOSIÇÃO
- Keywords: Iron-molybdenum alloy; Electrodeposition; Sorbitol alkaline bath; Molybdenum oxide; Induced deposition
- Language: Inglês
- Imprenta:
- Source:
- Título: Journal of Alloys and Compounds
- ISSN: 0925-8388
- Volume/Número/Paginação/Ano: v. 750, p. 577-586, June 2018
- Este periódico é de acesso aberto
- Este artigo NÃO é de acesso aberto
-
ABNT
ZACARIN, Maria G. et al. Investigation of the Fe-Mo electrodeposition from sorbitol alkaline bath and characterization of the films produced. Journal of Alloys and Compounds, v. 750, p. 577-586, 2018Tradução . . Disponível em: https://doi.org/10.1016/j.jallcom.2018.04.020. Acesso em: 20 jan. 2026. -
APA
Zacarin, M. G., Brito, M. M., Barbano, E. P., Carlos, R. M., Mastelaro, V. R., & Carlos, I. A. (2018). Investigation of the Fe-Mo electrodeposition from sorbitol alkaline bath and characterization of the films produced. Journal of Alloys and Compounds, 750, 577-586. doi:10.1016/j.jallcom.2018.04.020 -
NLM
Zacarin MG, Brito MM, Barbano EP, Carlos RM, Mastelaro VR, Carlos IA. Investigation of the Fe-Mo electrodeposition from sorbitol alkaline bath and characterization of the films produced [Internet]. Journal of Alloys and Compounds. 2018 ; 750 577-586.[citado 2026 jan. 20 ] Available from: https://doi.org/10.1016/j.jallcom.2018.04.020 -
Vancouver
Zacarin MG, Brito MM, Barbano EP, Carlos RM, Mastelaro VR, Carlos IA. Investigation of the Fe-Mo electrodeposition from sorbitol alkaline bath and characterization of the films produced [Internet]. Journal of Alloys and Compounds. 2018 ; 750 577-586.[citado 2026 jan. 20 ] Available from: https://doi.org/10.1016/j.jallcom.2018.04.020 - In-depth understanding of the relation between CuAlO2 particle size and morphology for ozone gas sensor detection at a nanoscale level
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Informações sobre o DOI: 10.1016/j.jallcom.2018.04.020 (Fonte: oaDOI API)
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