Highly hydrophobic hierarchical nanomicro roughness polymer surface created by stamping and laser micromachining (2015)
- Authors:
- USP affiliated authors: CARDOSO, MARCOS ROBERTO - IFSC ; MENDONÇA, CLEBER RENATO - IFSC
- Unidade: IFSC
- DOI: 10.1002/app.42082
- Subjects: NANOTECNOLOGIA; POLÍMEROS (MATERIAIS)
- Language: Inglês
- Imprenta:
- Publisher: John Wiley and Sons
- Publisher place: Hoboken
- Date published: 2015
- Source:
- Título do periódico: Journal of Applied Polymer Science
- ISSN: 0021-8995
- Volume/Número/Paginação/Ano: v. 132, n. 24,p. 42082-1-42082-4, June 2015
- Este periódico é de assinatura
- Este artigo NÃO é de acesso aberto
- Cor do Acesso Aberto: closed
-
ABNT
CARDOSO, Marcos Roberto; MARTINS, Renato J.; DEV, Apurba; VOSS, Tobias; MENDONÇA, Cleber Renato. Highly hydrophobic hierarchical nanomicro roughness polymer surface created by stamping and laser micromachining. Journal of Applied Polymer Science, Hoboken, John Wiley and Sons, v. 132, n. 24, p. 42082-1-42082-4, 2015. Disponível em: < http://dx.doi.org/10.1002/app.42082 > DOI: 10.1002/app.42082. -
APA
Cardoso, M. R., Martins, R. J., Dev, A., Voss, T., & Mendonça, C. R. (2015). Highly hydrophobic hierarchical nanomicro roughness polymer surface created by stamping and laser micromachining. Journal of Applied Polymer Science, 132( 24), 42082-1-42082-4. doi:10.1002/app.42082 -
NLM
Cardoso MR, Martins RJ, Dev A, Voss T, Mendonça CR. Highly hydrophobic hierarchical nanomicro roughness polymer surface created by stamping and laser micromachining [Internet]. Journal of Applied Polymer Science. 2015 ; 132( 24): 42082-1-42082-4.Available from: http://dx.doi.org/10.1002/app.42082 -
Vancouver
Cardoso MR, Martins RJ, Dev A, Voss T, Mendonça CR. Highly hydrophobic hierarchical nanomicro roughness polymer surface created by stamping and laser micromachining [Internet]. Journal of Applied Polymer Science. 2015 ; 132( 24): 42082-1-42082-4.Available from: http://dx.doi.org/10.1002/app.42082 - Integration of polymeric microstructures by silica nanowires
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Informações sobre o DOI: 10.1002/app.42082 (Fonte: oaDOI API)
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