Development of planar microfluxgates using FeNi and FeNiCo electrodeposited cores

Development of planar microfluxgates using FeNi and FeNiCo electrodeposited cores (2009)

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ABNT

HEIMFARTH, Tobias; MULATO, Marcelo. Development of planar microfluxgates using FeNi and FeNiCo electrodeposited cores. Anais.. Rio de Janeiro: [s.n.], 2009.
APA

Heimfarth, T., & Mulato, M. (2009). Development of planar microfluxgates using FeNi and FeNiCo electrodeposited cores. In Abstracts. Rio de Janeiro.
NLM

Heimfarth T, Mulato M. Development of planar microfluxgates using FeNi and FeNiCo electrodeposited cores. Abstracts. 2009 ;
Vancouver

Heimfarth T, Mulato M. Development of planar microfluxgates using FeNi and FeNiCo electrodeposited cores. Abstracts. 2009 ;