Development of planar microfluxgates using FeNi and FeNiCo electrodeposited cores (2009)
- Authors:
- Autor USP: MULATO, MARCELO - FFCLRP
- Unidade: FFCLRP
- Assunto: FÍSICA
- Language: Inglês
- Imprenta:
- Publisher place: Rio de Janeiro
- Date published: 2009
- Source:
- Título: Abstracts
- Conference titles: International Conference on Advanced Materials (ICAM)
-
ABNT
HEIMFARTH, Tobias e MULATO, Marcelo. Development of planar microfluxgates using FeNi and FeNiCo electrodeposited cores. 2009, Anais.. Rio de Janeiro: Faculdade de Filosofia, Ciências e Letras de Ribeirão Preto, Universidade de São Paulo, 2009. . Acesso em: 23 jan. 2026. -
APA
Heimfarth, T., & Mulato, M. (2009). Development of planar microfluxgates using FeNi and FeNiCo electrodeposited cores. In Abstracts. Rio de Janeiro: Faculdade de Filosofia, Ciências e Letras de Ribeirão Preto, Universidade de São Paulo. -
NLM
Heimfarth T, Mulato M. Development of planar microfluxgates using FeNi and FeNiCo electrodeposited cores. Abstracts. 2009 ;[citado 2026 jan. 23 ] -
Vancouver
Heimfarth T, Mulato M. Development of planar microfluxgates using FeNi and FeNiCo electrodeposited cores. Abstracts. 2009 ;[citado 2026 jan. 23 ] - Nanoelectronic discrimination of nonmalignant and malignant cells using nanotube field-effect transistors
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