Electrodeposition magnetic CoPd thin films: influence of plating condition (2005)
- Authors:
- Autor USP: SUMODJO, PAULO TENG AN - IQ
- Unidade: IQ
- Subjects: ELETRODEPOSIÇÃO; FILMES FINOS
- Language: Inglês
- Imprenta:
- Publisher: Electrochemical Society
- Publisher place: Pennington
- Date published: 2005
- Source:
- Título: Abstracts
- Conference titles: ECS - Meeting of the Electrochemical Society
-
ABNT
TAKATA, Fernanda Merie e SUMODJO, Paulo Teng An. Electrodeposition magnetic CoPd thin films: influence of plating condition. 2005, Anais.. Pennington: Electrochemical Society, 2005. . Acesso em: 03 out. 2024. -
APA
Takata, F. M., & Sumodjo, P. T. A. (2005). Electrodeposition magnetic CoPd thin films: influence of plating condition. In Abstracts. Pennington: Electrochemical Society. -
NLM
Takata FM, Sumodjo PTA. Electrodeposition magnetic CoPd thin films: influence of plating condition. Abstracts. 2005 ;[citado 2024 out. 03 ] -
Vancouver
Takata FM, Sumodjo PTA. Electrodeposition magnetic CoPd thin films: influence of plating condition. Abstracts. 2005 ;[citado 2024 out. 03 ] - Studies of electrodeposition kinetics of Co-Fe films on platinum
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