Doping by difussion and implantation of V, Cr, Mn and Fe ions in uncoloured beryl crystals

Doping by difussion and implantation of V, Cr, Mn and Fe ions in uncoloured beryl crystals (2003)

Authors:
USP affiliated authors: WATANABE, SHIGUEO - IF ; MATSUOKA, MASAO - IF
Unidade: IF
Subjects: DOSIMETRIA; DOSIMETRIA TERMOLUMINESCENTE
Language: Inglês
Imprenta:
- Publisher: Instituto de Física, Universidade Federal do Rio Grande do Sul
- Publisher place: Porto Alegre
- Date published: 2003
Source:
- Título: Final Programme and Abstracts
- Volume/Número/Paginação/Ano: Porto Alegre : Instituto de Física.Universidade Federal do Rio Grande do Sul, 2003
Conference titles: International Conference on Radiation Effects in Insulators

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ABNT

MITTANI, Juan Carlos Ramirez et al. Doping by difussion and implantation of V, Cr, Mn and Fe ions in uncoloured beryl crystals. 2003, Anais.. Porto Alegre: Instituto de Física, Universidade Federal do Rio Grande do Sul, 2003. . Acesso em: 18 fev. 2026.
APA

Mittani, J. C. R., Watanabe, S., Matsuoka, M., Baptista, D. L., & Zawislak, F. C. (2003). Doping by difussion and implantation of V, Cr, Mn and Fe ions in uncoloured beryl crystals. In Final Programme and Abstracts. Porto Alegre: Instituto de Física, Universidade Federal do Rio Grande do Sul.
NLM

Mittani JCR, Watanabe S, Matsuoka M, Baptista DL, Zawislak FC. Doping by difussion and implantation of V, Cr, Mn and Fe ions in uncoloured beryl crystals. Final Programme and Abstracts. 2003 ;[citado 2026 fev. 18 ]
Vancouver

Mittani JCR, Watanabe S, Matsuoka M, Baptista DL, Zawislak FC. Doping by difussion and implantation of V, Cr, Mn and Fe ions in uncoloured beryl crystals. Final Programme and Abstracts. 2003 ;[citado 2026 fev. 18 ]