Analysis of the leakage drain current accumulation-mode SOI pMOSFETs operating up to 300º C (2000)
- Authors:
- Autor USP: MARTINO, JOAO ANTONIO - EP
- Unidade: EP
- Assunto: CIRCUITOS INTEGRADOS
- Language: Inglês
- Imprenta:
- Publisher: IEEE/SBC
- Publisher place: Piscataway
- Date published: 2000
- Source:
- Título do periódico: LATW 00: proceedings
- Conference titles: IEEE Latin American Test Workshop
-
ABNT
BELLODI, Marcello; MARTINO, João Antonio. Analysis of the leakage drain current accumulation-mode SOI pMOSFETs operating up to 300º C. Anais.. Piscataway: IEEE/SBC, 2000. -
APA
Bellodi, M., & Martino, J. A. (2000). Analysis of the leakage drain current accumulation-mode SOI pMOSFETs operating up to 300º C. In LATW 00: proceedings. Piscataway: IEEE/SBC. -
NLM
Bellodi M, Martino JA. Analysis of the leakage drain current accumulation-mode SOI pMOSFETs operating up to 300º C. LATW 00: proceedings. 2000 ; -
Vancouver
Bellodi M, Martino JA. Analysis of the leakage drain current accumulation-mode SOI pMOSFETs operating up to 300º C. LATW 00: proceedings. 2000 ; - Transistor soi-nmosfet nao auto-alinhado
- Impact of substrate effect on the fully depleted soi mesfet subthreshold slope at 300k and 77k
- Simple method for the determination of the interface trap density at 77k in fully depleted acumulation mode soi mosfets
- Metodo simples para a obtencao da densidade de armadilhas na primeira e segunda interface em soi-mosfet
- Combined l and series resistance extraction of ldd mosfets
- Influencia da temperatura em transistores soi (silicon on insulator) mosfets
- New method for determination of the fixed charge densities at the buried oxide interfaces in soi mosfets
- Modelagem do substrato e novos métodos de caracterização elétrica de SOI MOSFET
- A novel leakage drain current model for SOI MOSFETs devices at high temperature
- Components of the leakage current in enhancement-mode SOI nMOSFETs at high temperature. (em CD-Rom)
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