Study of KCl+X% InCl and KCl+X% TlCl thin films (1997)
- Authors:
- Autor USP: LI, MAXIMO SIU - IFSC
- Unidade: IFSC
- Subjects: SEMICONDUTORES; MATÉRIA CONDENSADA (PROPRIEDADES ELÉTRICAS); MATÉRIA CONDENSADA
- Language: Inglês
- Imprenta:
- Publisher place: Campos do Jordão
- Date published: 1997
- Conference titles: Symposium on Defect Dependent Processes in Insulators and Seminconductors
-
ABNT
RUBO, Elisabete Aparecida Andrello e SIU LI, Máximo. Study of KCl+X% InCl and KCl+X% TlCl thin films. 1997, Anais.. Campos do Jordão: Instituto de Física de São Carlos, Universidade de São Paulo, 1997. . Acesso em: 11 fev. 2026. -
APA
Rubo, E. A. A., & Siu Li, M. (1997). Study of KCl+X% InCl and KCl+X% TlCl thin films. In . Campos do Jordão: Instituto de Física de São Carlos, Universidade de São Paulo. -
NLM
Rubo EAA, Siu Li M. Study of KCl+X% InCl and KCl+X% TlCl thin films. 1997 ;[citado 2026 fev. 11 ] -
Vancouver
Rubo EAA, Siu Li M. Study of KCl+X% InCl and KCl+X% TlCl thin films. 1997 ;[citado 2026 fev. 11 ] - pH influence on 'ZN'S structural and optical properties
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