Effect of oxygen additive on microwave plasma for diamond film synthesis by the plasma impedance measurement (1996)
- Authors:
- Autor USP: MIYAKE, HIDEAKI - IF
- Unidade: IF
- Assunto: FÍSICA TEÓRICA
- Language: Inglês
- Imprenta:
- Source:
- Título: Japanese Journal Applied Physics
- Volume/Número/Paginação/Ano: v.35, n.7b pt.2, p.l933-6, 1996
-
ABNT
MIYAKE, Hideaki et al. Effect of oxygen additive on microwave plasma for diamond film synthesis by the plasma impedance measurement. Japanese Journal Applied Physics, v. 35, n. 7b pt.2, p. l933-6, 1996Tradução . . Acesso em: 27 dez. 2025. -
APA
Miyake, H., Sugahara, K. I., Kobayashi, T., Kondo, K., Taniguchi, M., & Sugiyo, M. (1996). Effect of oxygen additive on microwave plasma for diamond film synthesis by the plasma impedance measurement. Japanese Journal Applied Physics, 35( 7b pt.2), l933-6. -
NLM
Miyake H, Sugahara KI, Kobayashi T, Kondo K, Taniguchi M, Sugiyo M. Effect of oxygen additive on microwave plasma for diamond film synthesis by the plasma impedance measurement. Japanese Journal Applied Physics. 1996 ;35( 7b pt.2): l933-6.[citado 2025 dez. 27 ] -
Vancouver
Miyake H, Sugahara KI, Kobayashi T, Kondo K, Taniguchi M, Sugiyo M. Effect of oxygen additive on microwave plasma for diamond film synthesis by the plasma impedance measurement. Japanese Journal Applied Physics. 1996 ;35( 7b pt.2): l933-6.[citado 2025 dez. 27 ] - Search for alpha-cluster states in `ANTPOT.92 Zr´
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