Thermal activation, cathodo- and photoluminescence measurements of rare earth doped (Tm, Tb, Dy, Eu, Sm, Yb) amorphous/nanocrystalline AlN thin films prepared by reactive rf-sputtering (2006)
- Autores:
- Autor USP: ZANATTA, ANTONIO RICARDO - IFSC
- Unidade: IFSC
- DOI: 10.1016/j.optmat.2005.09.024
- Assuntos: FILMES FINOS; LUMINESCÊNCIA; TERRAS RARAS
- Idioma: Inglês
- Imprenta:
- Fonte:
- Título do periódico: Optical Materials
- ISSN: 0925-3467
- Volume/Número/Paginação/Ano: v. 28, n. 6/7, p. 790-793, May 2006
- Este periódico é de assinatura
- Este artigo NÃO é de acesso aberto
- Cor do Acesso Aberto: closed
-
ABNT
WEINGÄRTNER, R. et al. Thermal activation, cathodo- and photoluminescence measurements of rare earth doped (Tm, Tb, Dy, Eu, Sm, Yb) amorphous/nanocrystalline AlN thin films prepared by reactive rf-sputtering. Optical Materials, v. 28, n. 6/7, p. 790-793, 2006Tradução . . Disponível em: https://doi.org/10.1016/j.optmat.2005.09.024. Acesso em: 19 abr. 2024. -
APA
Weingärtner, R., Erlenbach, O., Winnacker, A., Welte, A., Brauer, I., Mendel, H., et al. (2006). Thermal activation, cathodo- and photoluminescence measurements of rare earth doped (Tm, Tb, Dy, Eu, Sm, Yb) amorphous/nanocrystalline AlN thin films prepared by reactive rf-sputtering. Optical Materials, 28( 6/7), 790-793. doi:10.1016/j.optmat.2005.09.024 -
NLM
Weingärtner R, Erlenbach O, Winnacker A, Welte A, Brauer I, Mendel H, Strunk HP, Ribeiro CTM, Zanatta AR. Thermal activation, cathodo- and photoluminescence measurements of rare earth doped (Tm, Tb, Dy, Eu, Sm, Yb) amorphous/nanocrystalline AlN thin films prepared by reactive rf-sputtering [Internet]. Optical Materials. 2006 ; 28( 6/7): 790-793.[citado 2024 abr. 19 ] Available from: https://doi.org/10.1016/j.optmat.2005.09.024 -
Vancouver
Weingärtner R, Erlenbach O, Winnacker A, Welte A, Brauer I, Mendel H, Strunk HP, Ribeiro CTM, Zanatta AR. Thermal activation, cathodo- and photoluminescence measurements of rare earth doped (Tm, Tb, Dy, Eu, Sm, Yb) amorphous/nanocrystalline AlN thin films prepared by reactive rf-sputtering [Internet]. Optical Materials. 2006 ; 28( 6/7): 790-793.[citado 2024 abr. 19 ] Available from: https://doi.org/10.1016/j.optmat.2005.09.024 - Structural investigation of cobalt oxide films grown by reactive DC magnetron sputtering
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- AIN aloys prepared by reactive radio frequency sputtering
- Pulsed laser crystallization of SiGe alloys on GaAs
- Photoluminescence of Sm and Er doped amorphous AIN
- Photoelectron spectroscopic study of amoprhous GaAsN films
- Microcrystalline silicon with high electron field-effect mobility deposited at '230 GRAUS'
- Laser-induced generation of micrometer-sized luminescent patterns on rare-earth-doped amorphous films
- Photon and electron excitation of rare-earth-doped amorphous SiN films
Informações sobre o DOI: 10.1016/j.optmat.2005.09.024 (Fonte: oaDOI API)
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