Agopian, Paula Ghedini Der 
; Martino, João Antonio ; Simoen, Eddy ; Claeys, Cor
Fonte: SBMicro 2007. Nome do evento: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assuntos: MICROELETRÔNICA, CIRCUITOS INTEGRADOS MOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
AGOPIAN, Paula Ghedini Der et al. The impact of the gate oxide thickness reduction on the gate induced floating body effect in SOI nMOSFETs. 2007, Anais.. Pennington: The Electrochemical Society, 2007. . Acesso em: 15 nov. 2025.APA
Agopian, P. G. D., Martino, J. A., Simoen, E., & Claeys, C. (2007). The impact of the gate oxide thickness reduction on the gate induced floating body effect in SOI nMOSFETs. In SBMicro 2007. Pennington: The Electrochemical Society.NLM
Agopian PGD, Martino JA, Simoen E, Claeys C. The impact of the gate oxide thickness reduction on the gate induced floating body effect in SOI nMOSFETs. SBMicro 2007. 2007 ;[citado 2025 nov. 15 ]Vancouver
Agopian PGD, Martino JA, Simoen E, Claeys C. The impact of the gate oxide thickness reduction on the gate induced floating body effect in SOI nMOSFETs. SBMicro 2007. 2007 ;[citado 2025 nov. 15 ]
