Effects of boron concentration upon oxygen precipitation in cz silicon (1987)
Source: Journal of Crystal Growth. Unidade: IF
ABNT
BULLA, Douglas Anderson Pereira et al. Effects of boron concentration upon oxygen precipitation in cz silicon. Journal of Crystal Growth, v. 85, n. 1-2, p. 91-6, 1987Tradução . . Disponível em: https://doi.org/10.1016/0022-0248(87)90208-9. Acesso em: 15 ago. 2024.APA
Bulla, D. A. P., Castro Junior, W. E., Stojanoff, V., Ponce, F. A., Hahn, S., & Tiller, W. A. (1987). Effects of boron concentration upon oxygen precipitation in cz silicon. Journal of Crystal Growth, 85( 1-2), 91-6. doi:10.1016/0022-0248(87)90208-9NLM
Bulla DAP, Castro Junior WE, Stojanoff V, Ponce FA, Hahn S, Tiller WA. Effects of boron concentration upon oxygen precipitation in cz silicon [Internet]. Journal of Crystal Growth. 1987 ;85( 1-2): 91-6.[citado 2024 ago. 15 ] Available from: https://doi.org/10.1016/0022-0248(87)90208-9Vancouver
Bulla DAP, Castro Junior WE, Stojanoff V, Ponce FA, Hahn S, Tiller WA. Effects of boron concentration upon oxygen precipitation in cz silicon [Internet]. Journal of Crystal Growth. 1987 ;85( 1-2): 91-6.[citado 2024 ago. 15 ] Available from: https://doi.org/10.1016/0022-0248(87)90208-9