Paper surface modification by plasma deposition of double layers of organic silicon compounds (2001)
Tan, Ing Hwie; Silva, Maria Lucia Pereira da; Demarquette, Nicole Raymonde 
Fonte: Journal of Materials Chemistry. Unidade: EP
Assunto: ENGENHARIA METALÚRGICA
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TAN, Ing Hwie e SILVA, Maria Lucia Pereira da e DEMARQUETTE, Nicole Raymonde. Paper surface modification by plasma deposition of double layers of organic silicon compounds. Journal of Materials Chemistry, v. 11, n. 4, p. 1019-1025, 2001Tradução . . Disponível em: https://doi.org/10.1039/b008050k. Acesso em: 29 jul. 2024.APA
Tan, I. H., Silva, M. L. P. da, & Demarquette, N. R. (2001). Paper surface modification by plasma deposition of double layers of organic silicon compounds. Journal of Materials Chemistry, 11( 4), 1019-1025. doi:10.1039/b008050kNLM
Tan IH, Silva MLP da, Demarquette NR. Paper surface modification by plasma deposition of double layers of organic silicon compounds [Internet]. Journal of Materials Chemistry. 2001 ; 11( 4): 1019-1025.[citado 2024 jul. 29 ] Available from: https://doi.org/10.1039/b008050kVancouver
Tan IH, Silva MLP da, Demarquette NR. Paper surface modification by plasma deposition of double layers of organic silicon compounds [Internet]. Journal of Materials Chemistry. 2001 ; 11( 4): 1019-1025.[citado 2024 jul. 29 ] Available from: https://doi.org/10.1039/b008050k
