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  • Source: International Journal of Surface Mining, Reclamation and Environment. Unidades: EP, FSP

    Subjects: CONTROLE AMBIENTAL EM MINERAÇÃO, POLUIÇÃO ATMOSFÉRICA (ANÁLISE FÍSICO-QUÍMICA)

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    • ABNT

      ALMEIDA, Ivo Torres de e ESTON, Sérgio Médici de e ASSUNÇÃO, João Vicente de. Characterization of suspended particulate matter in mining areas in São Paulo, Brazil. International Journal of Surface Mining, Reclamation and Environment, v. 16, n. 3, p. 171-179, 2002Tradução . . Acesso em: 05 nov. 2024.
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      Almeida, I. T. de, Eston, S. M. de, & Assunção, J. V. de. (2002). Characterization of suspended particulate matter in mining areas in São Paulo, Brazil. International Journal of Surface Mining, Reclamation and Environment, 16( 3), 171-179.
    • NLM

      Almeida IT de, Eston SM de, Assunção JV de. Characterization of suspended particulate matter in mining areas in São Paulo, Brazil. International Journal of Surface Mining, Reclamation and Environment. 2002 ; 16( 3): 171-179.[citado 2024 nov. 05 ]
    • Vancouver

      Almeida IT de, Eston SM de, Assunção JV de. Characterization of suspended particulate matter in mining areas in São Paulo, Brazil. International Journal of Surface Mining, Reclamation and Environment. 2002 ; 16( 3): 171-179.[citado 2024 nov. 05 ]
  • Source: IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control. Unidade: EP

    Subjects: PROCESSAMENTO DE SINAIS ACÚSTICOS, MEDIÇÃO MECÂNICA

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      HIGUTI, Ricardo Tokio e ADAMOWSKI, Júlio Cezar. Ultrasonic densitometer using a multiple reflection technique. IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control, v. 49, n. 9, p. 1260-1268, 2002Tradução . . Disponível em: https://doi.org/10.1109/tuffc.2002.1041543. Acesso em: 05 nov. 2024.
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      Higuti, R. T., & Adamowski, J. C. (2002). Ultrasonic densitometer using a multiple reflection technique. IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control, 49( 9), 1260-1268. doi:10.1109/tuffc.2002.1041543
    • NLM

      Higuti RT, Adamowski JC. Ultrasonic densitometer using a multiple reflection technique [Internet]. IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control. 2002 ; 49( 9): 1260-1268.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1109/tuffc.2002.1041543
    • Vancouver

      Higuti RT, Adamowski JC. Ultrasonic densitometer using a multiple reflection technique [Internet]. IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control. 2002 ; 49( 9): 1260-1268.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1109/tuffc.2002.1041543
  • Source: Journal of Clinical Laser Medicine & Surgery. Unidade: FORP

    Subjects: MATERIAIS DENTÁRIOS, RESTAURAÇÃO DENTÁRIA

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      BORSATO, Maria Cristina et al. Microleakage of a resin sealant after acid-etching, Er:YAG laser irradiation and air abrasion of pits and fissures. Journal of Clinical Laser Medicine & Surgery, v. 19, n. 2, p. 83-87, 2001Tradução . . Acesso em: 05 nov. 2024.
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      Borsato, M. C., Borsato, M. C., Corona, S. A. M., Palma Dibb, R. G., Ramos, R. P., & Pécora, J. D. (2001). Microleakage of a resin sealant after acid-etching, Er:YAG laser irradiation and air abrasion of pits and fissures. Journal of Clinical Laser Medicine & Surgery, 19( 2), 83-87.
    • NLM

      Borsato MC, Borsato MC, Corona SAM, Palma Dibb RG, Ramos RP, Pécora JD. Microleakage of a resin sealant after acid-etching, Er:YAG laser irradiation and air abrasion of pits and fissures. Journal of Clinical Laser Medicine & Surgery. 2001 ; 19( 2): 83-87.[citado 2024 nov. 05 ]
    • Vancouver

      Borsato MC, Borsato MC, Corona SAM, Palma Dibb RG, Ramos RP, Pécora JD. Microleakage of a resin sealant after acid-etching, Er:YAG laser irradiation and air abrasion of pits and fissures. Journal of Clinical Laser Medicine & Surgery. 2001 ; 19( 2): 83-87.[citado 2024 nov. 05 ]
  • Source: Institution of Chemical Engineers. Transactions. Part C. Unidades: FCFRP, IQSC

    Assunto: QUÍMICA ANALÍTICA

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      RUNHA, F. P. et al. Production of dry extracts of medicinal brazilian plants by spouted bed process: developement of the process and evaluation of thermal degradation during the drying operation. Institution of Chemical Engineers. Transactions. Part C, v. 79, p. 160-168, 2001Tradução . . Acesso em: 05 nov. 2024.
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      Runha, F. P., Cordeiro, D. S., Pereira, C. A. M., Yariwake, J. H., & Oliveira, W. P. de. (2001). Production of dry extracts of medicinal brazilian plants by spouted bed process: developement of the process and evaluation of thermal degradation during the drying operation. Institution of Chemical Engineers. Transactions. Part C, 79, 160-168.
    • NLM

      Runha FP, Cordeiro DS, Pereira CAM, Yariwake JH, Oliveira WP de. Production of dry extracts of medicinal brazilian plants by spouted bed process: developement of the process and evaluation of thermal degradation during the drying operation. Institution of Chemical Engineers. Transactions. Part C. 2001 ; 79 160-168.[citado 2024 nov. 05 ]
    • Vancouver

      Runha FP, Cordeiro DS, Pereira CAM, Yariwake JH, Oliveira WP de. Production of dry extracts of medicinal brazilian plants by spouted bed process: developement of the process and evaluation of thermal degradation during the drying operation. Institution of Chemical Engineers. Transactions. Part C. 2001 ; 79 160-168.[citado 2024 nov. 05 ]
  • Source: IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control. Unidade: EP

    Assunto: MÉTODOS NUMÉRICOS DE OTIMIZAÇÃO

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      SILVA, Emílio Carlos Nelli e NISHIWAKI, Shinji e KIKUCHI, Noburo. Topology optimization design of flextensional actutors. IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control, v. 47, n. 3, p. 657-671, 2000Tradução . . Disponível em: https://repositorio.usp.br/directbitstream/c8d8a9e5-1c22-48af-a035-4fa8876df7dd/Silva_E-2000-Topology%20optimization%20design%20of%20flextensional%20actutors.pdf. Acesso em: 05 nov. 2024.
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      Silva, E. C. N., Nishiwaki, S., & Kikuchi, N. (2000). Topology optimization design of flextensional actutors. IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control, 47( 3), 657-671. Recuperado de https://repositorio.usp.br/directbitstream/c8d8a9e5-1c22-48af-a035-4fa8876df7dd/Silva_E-2000-Topology%20optimization%20design%20of%20flextensional%20actutors.pdf
    • NLM

      Silva ECN, Nishiwaki S, Kikuchi N. Topology optimization design of flextensional actutors [Internet]. IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control. 2000 ; 47( 3): 657-671.[citado 2024 nov. 05 ] Available from: https://repositorio.usp.br/directbitstream/c8d8a9e5-1c22-48af-a035-4fa8876df7dd/Silva_E-2000-Topology%20optimization%20design%20of%20flextensional%20actutors.pdf
    • Vancouver

      Silva ECN, Nishiwaki S, Kikuchi N. Topology optimization design of flextensional actutors [Internet]. IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control. 2000 ; 47( 3): 657-671.[citado 2024 nov. 05 ] Available from: https://repositorio.usp.br/directbitstream/c8d8a9e5-1c22-48af-a035-4fa8876df7dd/Silva_E-2000-Topology%20optimization%20design%20of%20flextensional%20actutors.pdf
  • Source: Thin Solid Films. Unidade: EP

    Assunto: FILMES FINOS

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      ZAMBOM, Luís da Silva et al. LPCVD deposition of silicon nitride assisted by high density plasmas. Thin Solid Films, v. 343-344, p. 299-301, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(98)01587-9. Acesso em: 05 nov. 2024.
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      Zambom, L. da S., Mansano, R. D., Furlan, R., & Verdonck, P. B. (1999). LPCVD deposition of silicon nitride assisted by high density plasmas. Thin Solid Films, 343-344, 299-301. doi:10.1016/s0040-6090(98)01587-9
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      Zambom L da S, Mansano RD, Furlan R, Verdonck PB. LPCVD deposition of silicon nitride assisted by high density plasmas [Internet]. Thin Solid Films. 1999 ; 343-344 299-301.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0040-6090(98)01587-9
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      Zambom L da S, Mansano RD, Furlan R, Verdonck PB. LPCVD deposition of silicon nitride assisted by high density plasmas [Internet]. Thin Solid Films. 1999 ; 343-344 299-301.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0040-6090(98)01587-9
  • Source: Materials Research Society Symposium Proceedings. Unidade: EP

    Assunto: DISPOSITIVOS ELETRÔNICOS

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      MARTINS, R. et al. The role of the species formed in PECVD systems on the density of state of a Si:H films. Materials Research Society Symposium Proceedings, v. 192, p. 175-180, 1990Tradução . . Acesso em: 05 nov. 2024.
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      Martins, R., Vieira, M., Fortunato, E., Santos, M., Dirani, E. A. T., Carvalho, N., et al. (1990). The role of the species formed in PECVD systems on the density of state of a Si:H films. Materials Research Society Symposium Proceedings, 192, 175-180.
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      Martins R, Vieira M, Fortunato E, Santos M, Dirani EAT, Carvalho N, Baia I, Guimarães I. The role of the species formed in PECVD systems on the density of state of a Si:H films. Materials Research Society Symposium Proceedings. 1990 ; 192 175-180.[citado 2024 nov. 05 ]
    • Vancouver

      Martins R, Vieira M, Fortunato E, Santos M, Dirani EAT, Carvalho N, Baia I, Guimarães I. The role of the species formed in PECVD systems on the density of state of a Si:H films. Materials Research Society Symposium Proceedings. 1990 ; 192 175-180.[citado 2024 nov. 05 ]

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