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Trabalho de evento
Analysis of the trade-off between voltage gain and frequency response of OTA designed using experimental data of omega-gate nanowire SOI MOSFETs (2023)
Araújo, Gustavo Vinicius de; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: SBMicro. Conference titles: Symposium on Microelectronics Technology and Devices. Unidade: EP
Subjects: TRANSISTORES, CIRCUITOS ANALÓGICOS, MICROELETRÔNICA, MATERIAIS NANOESTRUTURADOS
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ABNT
ARAÚJO, Gustavo Vinicius de e MARTINO, João Antonio e AGOPIAN, Paula Ghedini Der. Analysis of the trade-off between voltage gain and frequency response of OTA designed using experimental data of omega-gate nanowire SOI MOSFETs. 2023, Anais.. [Piscataway, N.J.]: IEEE, 2023. Disponível em: https://doi.org/10.1109/SBMicro60499.2023.10302603. Acesso em: 30 maio 2024.
APA
Araújo, G. V. de, Martino, J. A., & Agopian, P. G. D. (2023). Analysis of the trade-off between voltage gain and frequency response of OTA designed using experimental data of omega-gate nanowire SOI MOSFETs. In SBMicro. [Piscataway, N.J.]: IEEE. doi:10.1109/SBMicro60499.2023.10302603
NLM
Araújo GV de, Martino JA, Agopian PGD. Analysis of the trade-off between voltage gain and frequency response of OTA designed using experimental data of omega-gate nanowire SOI MOSFETs [Internet]. SBMicro. 2023 ;[citado 2024 maio 30 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302603
Vancouver
Araújo GV de, Martino JA, Agopian PGD. Analysis of the trade-off between voltage gain and frequency response of OTA designed using experimental data of omega-gate nanowire SOI MOSFETs [Internet]. SBMicro. 2023 ;[citado 2024 maio 30 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302603
Artigo de periodico
Comparison of low-dropout voltage regulators designed with line and nanowire tunnel-FET experimental data including a simple process variability analysis (2023)
Silva, Wenita de Lima; Toledo, Rodrigo do Nascimento; Gonçalez Filho, Walter; Nogueira, Alexandro de Moraes; Agopian, Paula Ghedini Der ; Martino, João Antonio
Source: Solid State Electronics. Unidade: EP
Subjects: TRANSISTORES, CIRCUITOS ANALÓGICOS, NANOTECNOLOGIA
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ABNT
SILVA, Wenita de Lima et al. Comparison of low-dropout voltage regulators designed with line and nanowire tunnel-FET experimental data including a simple process variability analysis. Solid State Electronics, v. 202, p. 1-8, 2023Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2023.108611. Acesso em: 30 maio 2024.
APA
Silva, W. de L., Toledo, R. do N., Gonçalez Filho, W., Nogueira, A. de M., Agopian, P. G. D., & Martino, J. A. (2023). Comparison of low-dropout voltage regulators designed with line and nanowire tunnel-FET experimental data including a simple process variability analysis. Solid State Electronics, 202, 1-8. doi:10.1016/j.sse.2023.108611
NLM
Silva W de L, Toledo R do N, Gonçalez Filho W, Nogueira A de M, Agopian PGD, Martino JA. Comparison of low-dropout voltage regulators designed with line and nanowire tunnel-FET experimental data including a simple process variability analysis [Internet]. Solid State Electronics. 2023 ; 202 1-8.[citado 2024 maio 30 ] Available from: https://doi.org/10.1016/j.sse.2023.108611
Vancouver
Silva W de L, Toledo R do N, Gonçalez Filho W, Nogueira A de M, Agopian PGD, Martino JA. Comparison of low-dropout voltage regulators designed with line and nanowire tunnel-FET experimental data including a simple process variability analysis [Internet]. Solid State Electronics. 2023 ; 202 1-8.[citado 2024 maio 30 ] Available from: https://doi.org/10.1016/j.sse.2023.108611
Trabalho de evento
Influence of gate insulator and AlGaN barrier layer on MISHEMT conduction mechanisms (2023)
Canales, Bruno Godoy; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: SBMicro. Conference titles: Symposium on Microelectronics Technology and Devices (SBMicro). Unidade: EP
Subjects: TRANSISTORES, SEMICONDUTORES
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ABNT
CANALES, Bruno Godoy e MARTINO, João Antonio e AGOPIAN, Paula Ghedini Der. Influence of gate insulator and AlGaN barrier layer on MISHEMT conduction mechanisms. 2023, Anais.. [Piscataway]: IEEE, 2023. Disponível em: https://doi.org/10.1109/SBMicro60499.2023.10302593. Acesso em: 30 maio 2024.
APA
Canales, B. G., Martino, J. A., & Agopian, P. G. D. (2023). Influence of gate insulator and AlGaN barrier layer on MISHEMT conduction mechanisms. In SBMicro. [Piscataway]: IEEE. doi:10.1109/SBMicro60499.2023.10302593
NLM
Canales BG, Martino JA, Agopian PGD. Influence of gate insulator and AlGaN barrier layer on MISHEMT conduction mechanisms [Internet]. SBMicro. 2023 ;[citado 2024 maio 30 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302593
Vancouver
Canales BG, Martino JA, Agopian PGD. Influence of gate insulator and AlGaN barrier layer on MISHEMT conduction mechanisms [Internet]. SBMicro. 2023 ;[citado 2024 maio 30 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302593
Trabalho de evento
Trade-off between channel length and mechanical stress in the operational transconductance amplifier designed with SOI FinFET (2023)
Ribeiro, Arllen D.R; Araújo, Gustavo Vinicius de; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: SBMicro. Conference titles: Symposium on Microelectronics Technology and Devices. Unidade: EP
Subjects: DISPOSITIVOS ELETRÔNICOS, TRANSISTORES, MICROELETRÔNICA
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ABNT
RIBEIRO, Arllen D.R et al. Trade-off between channel length and mechanical stress in the operational transconductance amplifier designed with SOI FinFET. 2023, Anais.. [Piscataway, N.J.]: IEEE, 2023. Disponível em: https://doi.org/10.1109/SBMicro60499.2023.10302575. Acesso em: 30 maio 2024.
APA
Ribeiro, A. D. R., Araújo, G. V. de, Martino, J. A., & Agopian, P. G. D. (2023). Trade-off between channel length and mechanical stress in the operational transconductance amplifier designed with SOI FinFET. In SBMicro. [Piscataway, N.J.]: IEEE. doi:10.1109/SBMicro60499.2023.10302575
NLM
Ribeiro ADR, Araújo GV de, Martino JA, Agopian PGD. Trade-off between channel length and mechanical stress in the operational transconductance amplifier designed with SOI FinFET [Internet]. SBMicro. 2023 ;[citado 2024 maio 30 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302575
Vancouver
Ribeiro ADR, Araújo GV de, Martino JA, Agopian PGD. Trade-off between channel length and mechanical stress in the operational transconductance amplifier designed with SOI FinFET [Internet]. SBMicro. 2023 ;[citado 2024 maio 30 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302575
Trabalho de evento
Study of the effect of multiple conductions on threshold voltage in a MIS-HEMT from 450 K down to 200 K (2023)
Perina, Welder Fernandes; Martino, João Antonio ; Simoen, Eddy ; Peralagu, Uthayasankaran; Collaert, Nadine ; Agopian, Paula Ghedini Der
Source: SBMicro. Conference titles: Symposium on Microelectronics Technology and Devices. Unidade: EP
Subjects: TRANSISTORES, SEMICONDUTORES
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ABNT
PERINA, Welder Fernandes et al. Study of the effect of multiple conductions on threshold voltage in a MIS-HEMT from 450 K down to 200 K. 2023, Anais.. [Piscataway, N.J.]: IEEE, 2023. Disponível em: https://doi.org/10.1109/SBMicro60499.2023.10302604. Acesso em: 30 maio 2024.
APA
Perina, W. F., Martino, J. A., Simoen, E., Peralagu, U., Collaert, N., & Agopian, P. G. D. (2023). Study of the effect of multiple conductions on threshold voltage in a MIS-HEMT from 450 K down to 200 K. In SBMicro. [Piscataway, N.J.]: IEEE. doi:10.1109/SBMicro60499.2023.10302604
NLM
Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. Study of the effect of multiple conductions on threshold voltage in a MIS-HEMT from 450 K down to 200 K [Internet]. SBMicro. 2023 ;[citado 2024 maio 30 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302604
Vancouver
Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. Study of the effect of multiple conductions on threshold voltage in a MIS-HEMT from 450 K down to 200 K [Internet]. SBMicro. 2023 ;[citado 2024 maio 30 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302604
Artigo de periodico
MISHEMT intrinsic voltage gain under multiple channel output characteristics (2023)
Canales, Bruno Godoy; Perina, Welder Fernandes; Martino, João Antonio ; Simoen, Eddy ; Peralagu, Uthayasankaran; Collaert, Nadine ; Agopian, Paula Ghedini Der
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: TRANSISTORES, SEMICONDUTORES
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ABNT
CANALES, Bruno Godoy et al. MISHEMT intrinsic voltage gain under multiple channel output characteristics. Semiconductor Science and Technology, v. 38, n. 11, p. 1-6, 2023Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/acfa1f. Acesso em: 30 maio 2024.
APA
Canales, B. G., Perina, W. F., Martino, J. A., Simoen, E., Peralagu, U., Collaert, N., & Agopian, P. G. D. (2023). MISHEMT intrinsic voltage gain under multiple channel output characteristics. Semiconductor Science and Technology, 38( 11), 1-6. doi:10.1088/1361-6641/acfa1f
NLM
Canales BG, Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. MISHEMT intrinsic voltage gain under multiple channel output characteristics [Internet]. Semiconductor Science and Technology. 2023 ; 38( 11): 1-6.[citado 2024 maio 30 ] Available from: https://doi.org/10.1088/1361-6641/acfa1f
Vancouver
Canales BG, Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. MISHEMT intrinsic voltage gain under multiple channel output characteristics [Internet]. Semiconductor Science and Technology. 2023 ; 38( 11): 1-6.[citado 2024 maio 30 ] Available from: https://doi.org/10.1088/1361-6641/acfa1f
Trabalho de evento
Analysis of low-dropout voltage regulator designed with gate-all-around nanosheet transistors (2023)
Souto, Rayana Carvalho de Barros; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: SBMicro. Conference titles: Symposium on Microelectronics Technology and Devices. Unidade: EP
Subjects: TRANSISTORES, MICROELETRÔNICA, MATERIAIS NANOESTRUTURADOS
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ABNT
SOUTO, Rayana Carvalho de Barros e MARTINO, João Antonio e AGOPIAN, Paula Ghedini Der. Analysis of low-dropout voltage regulator designed with gate-all-around nanosheet transistors. 2023, Anais.. [Piscataway]: IEEE, 2023. Disponível em: https://doi.org/10.1109/SBMicro60499.2023.10302596. Acesso em: 30 maio 2024.
APA
Souto, R. C. de B., Martino, J. A., & Agopian, P. G. D. (2023). Analysis of low-dropout voltage regulator designed with gate-all-around nanosheet transistors. In SBMicro. [Piscataway]: IEEE. doi:10.1109/SBMicro60499.2023.10302596
NLM
Souto RC de B, Martino JA, Agopian PGD. Analysis of low-dropout voltage regulator designed with gate-all-around nanosheet transistors [Internet]. SBMicro. 2023 ;[citado 2024 maio 30 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302596
Vancouver
Souto RC de B, Martino JA, Agopian PGD. Analysis of low-dropout voltage regulator designed with gate-all-around nanosheet transistors [Internet]. SBMicro. 2023 ;[citado 2024 maio 30 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302596
Artigo de periodico
Low-dropout voltage regulator designed with nanowire TFET with different source composition experimental data (2023)
Toledo, Rodrigo do Nascimento; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: Journal of Integrated Circuits and Systems. Unidade: EP
Subjects: TRANSISTORES, CIRCUITOS ANALÓGICOS, NANOTECNOLOGIA
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ABNT
TOLEDO, Rodrigo do Nascimento e MARTINO, João Antonio e AGOPIAN, Paula Ghedini Der. Low-dropout voltage regulator designed with nanowire TFET with different source composition experimental data. Journal of Integrated Circuits and Systems, v. 18, n. 1, p. 1-6, 2023Tradução . . Disponível em: https://doi.org/10.29292/jics.v18i1.653. Acesso em: 30 maio 2024.
APA
Toledo, R. do N., Martino, J. A., & Agopian, P. G. D. (2023). Low-dropout voltage regulator designed with nanowire TFET with different source composition experimental data. Journal of Integrated Circuits and Systems, 18( 1), 1-6. doi:10.29292/jics.v18il.653
NLM
Toledo R do N, Martino JA, Agopian PGD. Low-dropout voltage regulator designed with nanowire TFET with different source composition experimental data [Internet]. Journal of Integrated Circuits and Systems. 2023 ;18( 1): 1-6.[citado 2024 maio 30 ] Available from: https://doi.org/10.29292/jics.v18i1.653
Vancouver
Toledo R do N, Martino JA, Agopian PGD. Low-dropout voltage regulator designed with nanowire TFET with different source composition experimental data [Internet]. Journal of Integrated Circuits and Systems. 2023 ;18( 1): 1-6.[citado 2024 maio 30 ] Available from: https://doi.org/10.29292/jics.v18i1.653
Trabalho de evento
Nanowire TFET with different source compositions applied to low-dropout voltage regulator (2022)
Toledo, Rodrigo do Nascimento; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: SBMICRO. Conference titles: Symposium on Microelectronics Technology. Unidade: EP
Subjects: TRANSISTORES, NANOELETRÔNICA, CIRCUITOS ANALÓGICOS
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ABNT
TOLEDO, Rodrigo do Nascimento e MARTINO, João Antonio e AGOPIAN, Paula Ghedini Der. Nanowire TFET with different source compositions applied to low-dropout voltage regulator. 2022, Anais.. Piscataway: IEEE, 2022. p. 1-4. Disponível em: https://www.doi.org/10.1109/SBMICRO55822.2022.9881035. Acesso em: 30 maio 2024.
APA
Toledo, R. do N., Martino, J. A., & Agopian, P. G. D. (2022). Nanowire TFET with different source compositions applied to low-dropout voltage regulator. In SBMICRO (p. 1-4). Piscataway: IEEE. doi:10.1109/SBMICRO55822.2022.9881035
NLM
Toledo R do N, Martino JA, Agopian PGD. Nanowire TFET with different source compositions applied to low-dropout voltage regulator [Internet]. SBMICRO. 2022 ; 1-4.[citado 2024 maio 30 ] Available from: https://www.doi.org/10.1109/SBMICRO55822.2022.9881035
Vancouver
Toledo R do N, Martino JA, Agopian PGD. Nanowire TFET with different source compositions applied to low-dropout voltage regulator [Internet]. SBMICRO. 2022 ; 1-4.[citado 2024 maio 30 ] Available from: https://www.doi.org/10.1109/SBMICRO55822.2022.9881035
Trabalho de evento
Experimental analysis of MISHEMT multiple conductions from 200K to 450K (2022)
Perina, Welder Fernandes; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: SBMICRO. Conference titles: Symposium on Microelectronics Technology. Unidade: EP
Subjects: TRANSISTORES, TEMPERATURA
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ABNT
PERINA, Welder Fernandes e MARTINO, João Antonio e AGOPIAN, Paula Ghedini Der. Experimental analysis of MISHEMT multiple conductions from 200K to 450K. 2022, Anais.. Piscataway: IEEE, 2022. p. 1-4. Disponível em: https://www.doi.org/10.1109/SBMICRO55822.2022.9881049. Acesso em: 30 maio 2024.
APA
Perina, W. F., Martino, J. A., & Agopian, P. G. D. (2022). Experimental analysis of MISHEMT multiple conductions from 200K to 450K. In SBMICRO (p. 1-4). Piscataway: IEEE. doi:10.1109/SBMICRO55822.2022.9881049
NLM
Perina WF, Martino JA, Agopian PGD. Experimental analysis of MISHEMT multiple conductions from 200K to 450K [Internet]. SBMICRO. 2022 ; 1-4.[citado 2024 maio 30 ] Available from: https://www.doi.org/10.1109/SBMICRO55822.2022.9881049
Vancouver
Perina WF, Martino JA, Agopian PGD. Experimental analysis of MISHEMT multiple conductions from 200K to 450K [Internet]. SBMICRO. 2022 ; 1-4.[citado 2024 maio 30 ] Available from: https://www.doi.org/10.1109/SBMICRO55822.2022.9881049
Trabalho de evento
Al source-drain schottky contact enabling N-type (Back Enhanced) BESOI MOSFET (2022)
Carvalho, Henrique Lanfredi; Rangel, Ricardo Cardoso; Sasaki, Kátia Regina Akemi ; Agopian, Paula Ghedini Der ; Yojo, Leonardo Shimizu; Martino, João Antonio
Source: SBMICRO. Conference titles: Symposium on Microelectronics Technology. Unidade: EP
Subjects: TRANSISTORES, DISPOSITIVOS ELETRÔNICOS, ALUMÍNIO, NANOELETRÔNICA, CIRCUITOS ANALÓGICOS
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ABNT
CARVALHO, Henrique Lanfredi et al. Al source-drain schottky contact enabling N-type (Back Enhanced) BESOI MOSFET. 2022, Anais.. Piscataway: IEEE, 2022. p. 1-4. Disponível em: https://www.doi.org/10.1109/SBMICRO55822.2022.9880960. Acesso em: 30 maio 2024.
APA
Carvalho, H. L., Rangel, R. C., Sasaki, K. R. A., Agopian, P. G. D., Yojo, L. S., & Martino, J. A. (2022). Al source-drain schottky contact enabling N-type (Back Enhanced) BESOI MOSFET. In SBMICRO (p. 1-4). Piscataway: IEEE. doi:10.1109/SBMICRO55822.2022.9880960
NLM
Carvalho HL, Rangel RC, Sasaki KRA, Agopian PGD, Yojo LS, Martino JA. Al source-drain schottky contact enabling N-type (Back Enhanced) BESOI MOSFET [Internet]. SBMICRO. 2022 ; 1-4.[citado 2024 maio 30 ] Available from: https://www.doi.org/10.1109/SBMICRO55822.2022.9880960
Vancouver
Carvalho HL, Rangel RC, Sasaki KRA, Agopian PGD, Yojo LS, Martino JA. Al source-drain schottky contact enabling N-type (Back Enhanced) BESOI MOSFET [Internet]. SBMICRO. 2022 ; 1-4.[citado 2024 maio 30 ] Available from: https://www.doi.org/10.1109/SBMICRO55822.2022.9880960
Trabalho de evento
Fabrication and electrical characterization of ISFET for H2O2 sensing (2022)
Duarte, Pedro Henrique; Rangel, Ricardo Cardoso; Ramos, Daniel Augusto; Yojo, Leonardo Shimizu; Mori, Carlos Augusto Bergfeld; Sasaki, Kátia Regina Akemi ; Agopian, Paula Ghedini Der ; Martino, João Antonio
Source: SBMICRO. Conference titles: Symposium on Microelectronics Technology. Unidade: EP
Subjects: TRANSISTORES, PERÓXIDO DE HIDROGÊNIO
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ABNT
DUARTE, Pedro Henrique et al. Fabrication and electrical characterization of ISFET for H2O2 sensing. 2022, Anais.. Piscataway: IEEE, 2022. p. 1-4. Disponível em: https://www.doi.org/10.1109/SBMICRO55822.2022.9881031. Acesso em: 30 maio 2024.
APA
Duarte, P. H., Rangel, R. C., Ramos, D. A., Yojo, L. S., Mori, C. A. B., Sasaki, K. R. A., et al. (2022). Fabrication and electrical characterization of ISFET for H2O2 sensing. In SBMICRO (p. 1-4). Piscataway: IEEE. doi:10.1109/SBMICRO55822.2022.9881031
NLM
Duarte PH, Rangel RC, Ramos DA, Yojo LS, Mori CAB, Sasaki KRA, Agopian PGD, Martino JA. Fabrication and electrical characterization of ISFET for H2O2 sensing [Internet]. SBMICRO. 2022 ; 1-4.[citado 2024 maio 30 ] Available from: https://www.doi.org/10.1109/SBMICRO55822.2022.9881031
Vancouver
Duarte PH, Rangel RC, Ramos DA, Yojo LS, Mori CAB, Sasaki KRA, Agopian PGD, Martino JA. Fabrication and electrical characterization of ISFET for H2O2 sensing [Internet]. SBMICRO. 2022 ; 1-4.[citado 2024 maio 30 ] Available from: https://www.doi.org/10.1109/SBMICRO55822.2022.9881031
Artigo de periodico
Numerical modeling of flow stress and grain evolution of an Mg AZ31B alloy based on hot compression tests (2020)
Giorjão, Rafael Arthur Reghine ; Monlevade, Eduardo Franco de ; Ávila Diaz, Julian Arnaldo ; Tschiptschin, André Paulo
Source: Journal of the Brazilian Society of Mechanical Sciences and Engineering. Unidade: EP
Subjects: PROPRIEDADES DOS MATERIAIS, RECRISTALIZAÇÃO
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ABNT
GIORJÃO, Rafael Arthur Reghine et al. Numerical modeling of flow stress and grain evolution of an Mg AZ31B alloy based on hot compression tests. Journal of the Brazilian Society of Mechanical Sciences and Engineering, v. 42, n. 57, p. 1-11, 2020Tradução . . Disponível em: https://doi.org/10.1007/s40430-019-2146-4. Acesso em: 30 maio 2024.
APA
Giorjão, R. A. R., Monlevade, E. F. de, Ávila Diaz, J. A., & Tschiptschin, A. P. (2020). Numerical modeling of flow stress and grain evolution of an Mg AZ31B alloy based on hot compression tests. Journal of the Brazilian Society of Mechanical Sciences and Engineering, 42( 57), 1-11. doi:10.1007/s40430-019-2146-4
NLM
Giorjão RAR, Monlevade EF de, Ávila Diaz JA, Tschiptschin AP. Numerical modeling of flow stress and grain evolution of an Mg AZ31B alloy based on hot compression tests [Internet]. Journal of the Brazilian Society of Mechanical Sciences and Engineering. 2020 ;42( 57): 1-11.[citado 2024 maio 30 ] Available from: https://doi.org/10.1007/s40430-019-2146-4
Vancouver
Giorjão RAR, Monlevade EF de, Ávila Diaz JA, Tschiptschin AP. Numerical modeling of flow stress and grain evolution of an Mg AZ31B alloy based on hot compression tests [Internet]. Journal of the Brazilian Society of Mechanical Sciences and Engineering. 2020 ;42( 57): 1-11.[citado 2024 maio 30 ] Available from: https://doi.org/10.1007/s40430-019-2146-4
Artigo de periodico
Dependence of Wear and Mechanical Behavior of Nitrocarburized/CrN/DLC Layer on Film Thickness (2019)
Conde, Fabio Faria ; Ávila Diaz, Julián Arnaldo ; Silva, Guilherme Faria da ; Tschiptschin, André Paulo
Source: Materials Research. Unidades: EP, EESC
Subjects: CARBONO, DESGASTE
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ABNT
CONDE, Fabio Faria et al. Dependence of Wear and Mechanical Behavior of Nitrocarburized/CrN/DLC Layer on Film Thickness. Materials Research, v. 22, n. 2, p. 1-7, 2019Tradução . . Disponível em: https://doi.org/10.1590/1980-5373-mr-2018-0499. Acesso em: 30 maio 2024.
APA
Conde, F. F., Ávila Diaz, J. A., Silva, G. F. da, & Tschiptschin, A. P. (2019). Dependence of Wear and Mechanical Behavior of Nitrocarburized/CrN/DLC Layer on Film Thickness. Materials Research, 22( 2), 1-7. doi:10.1590/1980-5373-mr-2018-0499
NLM
Conde FF, Ávila Diaz JA, Silva GF da, Tschiptschin AP. Dependence of Wear and Mechanical Behavior of Nitrocarburized/CrN/DLC Layer on Film Thickness [Internet]. Materials Research. 2019 ;22( 2): 1-7.[citado 2024 maio 30 ] Available from: https://doi.org/10.1590/1980-5373-mr-2018-0499
Vancouver
Conde FF, Ávila Diaz JA, Silva GF da, Tschiptschin AP. Dependence of Wear and Mechanical Behavior of Nitrocarburized/CrN/DLC Layer on Film Thickness [Internet]. Materials Research. 2019 ;22( 2): 1-7.[citado 2024 maio 30 ] Available from: https://doi.org/10.1590/1980-5373-mr-2018-0499

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