Fonte: Microelectronics technology and devices SBMicro 2004.. Nome do evento: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assuntos: MICROELETRÔNICA, ELETROQUÍMICA, FILMES FINOS
ABNT
ARAÚJO, Hugo Puertas de e SANTOS FILHO, Sebastião Gomes dos e VALLE, Márcio de Almeida. Birefringence characterization of TiO2 thin films deposited by DC sputtering over tilted substrates. 2004, Anais.. Pennington: The Electrochemical Society, 2004. . Acesso em: 08 nov. 2025.APA
Araújo, H. P. de, Santos Filho, S. G. dos, & Valle, M. de A. (2004). Birefringence characterization of TiO2 thin films deposited by DC sputtering over tilted substrates. In Microelectronics technology and devices SBMicro 2004.. Pennington: The Electrochemical Society.NLM
Araújo HP de, Santos Filho SG dos, Valle M de A. Birefringence characterization of TiO2 thin films deposited by DC sputtering over tilted substrates. Microelectronics technology and devices SBMicro 2004. 2004 ;[citado 2025 nov. 08 ]Vancouver
Araújo HP de, Santos Filho SG dos, Valle M de A. Birefringence characterization of TiO2 thin films deposited by DC sputtering over tilted substrates. Microelectronics technology and devices SBMicro 2004. 2004 ;[citado 2025 nov. 08 ]

