Velasquez, E L Z; Fantini, Márcia Carvalho de Abreu 
; Páez Carreño, Marcelo Nelson ; Pereyra, Inés ; Takahashi, H; Landers, R
Fonte: Journal of Applied Physics. Unidades: EP, IF
Assunto: MATÉRIA CONDENSADA
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ABNT
VELASQUEZ, E L Z et al. Effect of plasma etching, carbon concentration, and buffer layer on the properties of a-'SI': h / a-'SI IND.1-X''C IND.X' : h multilayers. Journal of Applied Physics, v. 75, n. ja 1994, p. 543-8, 1994Tradução . . Acesso em: 01 nov. 2024.APA
Velasquez, E. L. Z., Fantini, M. C. de A., Páez Carreño, M. N., Pereyra, I., Takahashi, H., & Landers, R. (1994). Effect of plasma etching, carbon concentration, and buffer layer on the properties of a-'SI': h / a-'SI IND.1-X''C IND.X' : h multilayers. Journal of Applied Physics, 75( ja 1994), 543-8.NLM
Velasquez ELZ, Fantini MC de A, Páez Carreño MN, Pereyra I, Takahashi H, Landers R. Effect of plasma etching, carbon concentration, and buffer layer on the properties of a-'SI': h / a-'SI IND.1-X''C IND.X' : h multilayers. Journal of Applied Physics. 1994 ;75( ja 1994): 543-8.[citado 2024 nov. 01 ]Vancouver
Velasquez ELZ, Fantini MC de A, Páez Carreño MN, Pereyra I, Takahashi H, Landers R. Effect of plasma etching, carbon concentration, and buffer layer on the properties of a-'SI': h / a-'SI IND.1-X''C IND.X' : h multilayers. Journal of Applied Physics. 1994 ;75( ja 1994): 543-8.[citado 2024 nov. 01 ]
