Microwave Photoresistance of a Two-Dimensional Topological Insulator in a HgTe Quantum Well (2020)
Yaroshevich, A S; Kvon, Z D; Gusev, G M 
; Mikhailov, N N
Source: JETP Letters. Unidade: IF
Assunto: POÇOS QUÂNTICOS
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ABNT
YAROSHEVICH, A S et al. Microwave Photoresistance of a Two-Dimensional Topological Insulator in a HgTe Quantum Well. JETP Letters, v. 111, n. 2, p. 121–125, 2020Tradução . . Disponível em: https://doi.org/10.1134/S0021364020020113. Acesso em: 28 maio 2024.APA
Yaroshevich, A. S., Kvon, Z. D., Gusev, G. M., & Mikhailov, N. N. (2020). Microwave Photoresistance of a Two-Dimensional Topological Insulator in a HgTe Quantum Well. JETP Letters, 111( 2), 121–125. doi:10.1134/S0021364020020113NLM
Yaroshevich AS, Kvon ZD, Gusev GM, Mikhailov NN. Microwave Photoresistance of a Two-Dimensional Topological Insulator in a HgTe Quantum Well [Internet]. JETP Letters. 2020 ;111( 2): 121–125.[citado 2024 maio 28 ] Available from: https://doi.org/10.1134/S0021364020020113Vancouver
Yaroshevich AS, Kvon ZD, Gusev GM, Mikhailov NN. Microwave Photoresistance of a Two-Dimensional Topological Insulator in a HgTe Quantum Well [Internet]. JETP Letters. 2020 ;111( 2): 121–125.[citado 2024 maio 28 ] Available from: https://doi.org/10.1134/S0021364020020113
