Khan, Niqab; Wolff, Rogério Nunes 
; Ullah, Hameed; Chacón, Gustavo J. ; Santa Rosa, Washington ; Dupont, Jairton ; Gonçalves, Renato Vitalino ; Khan, Sherdil
Source: Materials Advances. Unidade: IFSC
Subjects: FOTOCATÁLISE, ELETROQUÍMICA, SEMICONDUTORES
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KHAN, Niqab et al. Ionic liquid based dopant-free band edge shift in BiVO4 particles for photocatalysis under simulated sunlight irradiation. Materials Advances, v. 3, n. 16, p. 6485-6495 + supplementary information, 2022Tradução . . Disponível em: https://doi.org/10.1039/d2ma00259k. Acesso em: 29 maio 2024.APA
Khan, N., Wolff, R. N., Ullah, H., Chacón, G. J., Santa Rosa, W., Dupont, J., et al. (2022). Ionic liquid based dopant-free band edge shift in BiVO4 particles for photocatalysis under simulated sunlight irradiation. Materials Advances, 3( 16), 6485-6495 + supplementary information. doi:10.1039/d2ma00259k.NLM
Khan N, Wolff RN, Ullah H, Chacón GJ, Santa Rosa W, Dupont J, Gonçalves RV, Khan S. Ionic liquid based dopant-free band edge shift in BiVO4 particles for photocatalysis under simulated sunlight irradiation [Internet]. Materials Advances. 2022 ; 3( 16): 6485-6495 + supplementary information.[citado 2024 maio 29 ] Available from: https://doi.org/10.1039/d2ma00259k.Vancouver
Khan N, Wolff RN, Ullah H, Chacón GJ, Santa Rosa W, Dupont J, Gonçalves RV, Khan S. Ionic liquid based dopant-free band edge shift in BiVO4 particles for photocatalysis under simulated sunlight irradiation [Internet]. Materials Advances. 2022 ; 3( 16): 6485-6495 + supplementary information.[citado 2024 maio 29 ] Available from: https://doi.org/10.1039/d2ma00259k.
